⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10506120 | 0.96 | TTR (0.33) | — | |
| SCHEMBL8984105 | 0.96 | TTR (0.43) | — | |
| SCHEMBL601264 | 0.79 | — | — | |
| SCHEMBL11134209 | 0.69 | TTR (0.38) | — | |
| SCHEMBL11130271 | 0.69 | TTR (0.38) | — | |
| SCHEMBL11130390 | 0.69 | TTR (0.38) | — | |
| SCHEMBL18207914 | 0.69 | — | — | |
| SCHEMBL23682710 | 0.67 | TTR (0.42) | — | |
| SCHEMBL10282070 | 0.64 | — | — | |
| SCHEMBL16878481 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 182 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260123372-A1 | MANUFACTURING SEMICONDUCTOR DEVICE USING SELECTIVE DIELECTRIC ON DIELECTRIC (DOD) DEPOSITION PROCESS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-30 | — | — | US | claimed |
| US-12518966-B2 | Selective plasma enhanced atomic layer deposition | VERSUM MATERIALS US, LLC (US) | 2026-01-06 | — | — | US | claimed |
| US-20240047196-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MAT US LLC (US) | 2024-02-08 | — | — | US | claimed |
| US-20240014036-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | VERSUM MATERIALS US, LLC | 2024-01-11 | — | — | US | claimed |
| US-20230416911-A1 | SELECTIVE DEPOSITION OF SILICON AND OXYGEN CONTAINING DIELECTRIC FILM ON DIELECTRICS | VERSUM MATERIALS US, LLC | 2023-12-28 | — | — | US | claimed |
| CN-116918029-A | selective thermal atomic layer deposition | 弗萨姆材料美国有限责任公司 | 2023-10-20 | — | — | CN | claimed |
| CN-116761906-A | Selective plasma enhanced atomic layer deposition | 弗萨姆材料美国有限责任公司 | 2023-09-15 | — | — | CN | claimed |
| EP-4240886-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | Versum Materials US, LLC (US) | 2023-09-13 | — | — | EP | claimed |
| EP-4241299-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | Versum Materials US, LLC (US) | 2023-09-13 | — | — | EP | claimed |
| CN-113933430-B | High-sensitivity and high-precision analysis method suitable for detecting organic sulfur compounds in main stream smoke of cigarettes | 中国烟草总公司郑州烟草研究院 | 2023-09-05 | — | — | CN | claimed |
| WO-2022119860-A9 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MATERIAL US, LLC (US) | 2023-08-24 | — | — | WO | claimed |
| EP-4225964-A1 | SELECTIVE DEPOSITION OF SILICON AND OXYGEN CONTAINING DIELECTRIC FILM ON DIELECTRICS | Versum Materials US, LLC (US) | 2023-08-16 | — | — | EP | claimed |
| CN-116583623-A | Selective deposition of silicon and oxygen containing dielectric films on dielectrics | 弗萨姆材料美国有限责任公司 | 2023-08-11 | — | — | CN | claimed |
| WO-2022119860-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MATERIAL US, LLC (US) | 2022-06-09 | — | — | WO | claimed |
| WO-2022119865-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | VERSUM MATERIALS US, LLC (US) | 2022-06-09 | — | — | WO | claimed |
| WO-2022104226-A1 | SELECTIVE DEPOSITION OF SILICON AND OXYGEN CONTAINING DIELECTRIC FILM ON DIELECTRICS | VERSUM MATERIALS US, LLC (US) | 2022-05-19 | — | — | WO | claimed |
| CN-113933430-A | High-sensitivity and high-precision analysis method suitable for detecting organic sulfur compounds in cigarette mainstream smoke | 中国烟草总公司郑州烟草研究院 | 2022-01-14 | — | — | CN | claimed |
| US-20260123372-A1 | MANUFACTURING SEMICONDUCTOR DEVICE USING SELECTIVE DIELECTRIC ON DIELECTRIC (DOD) DEPOSITION PROCESS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-30 | — | — | US | disclosed |
| EP-1020444-A1 | 6-PHENOXYPICOLINIC ACID, ALKYLIDENEHYDRAZIDE DERIVATIVES, PROCESS FOR PRODUCING THE SAME, AND HERBICIDE | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2000-07-19 | — | — | EP | disclosed |
| US-6001850-A | HAVING GONADOTROPIN-RELEASING HORMONE ANTAGONISTIC ACTIVITY ARE USEFUL AS PROPHYLACTIC OR THERAPEUTIC AGENTS FOR THE PREVENTION OR TREATMENT OF SEVERAL HORMONE DEPENDENT DISEASES | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1999-12-14 | — | — | US | disclosed |