⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6013345 | 0.75 | — | — | |
| SCHEMBL778652 | 0.72 | USP2 (0.44) | — | |
| SCHEMBL3215329 | 0.72 | USP2 (0.44) | — | |
| SCHEMBL2511823 | 0.72 | — | — | |
| SCHEMBL197643 | 0.72 | — | — | |
| SCHEMBL31540350 | 0.71 | — | — | |
| SCHEMBL31540349 | 0.71 | — | — | |
| SCHEMBL25737918 | 0.69 | USP2 (0.30) | — | |
| SCHEMBL28028307 | 0.69 | — | — | |
| Ammonia Solution, Strong SCHEMBL27498539 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170017157-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD OF LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2017-01-19 | — | — | US | disclosed |
| US-9535323-B2 | Lithographic printing plate precursor and plate making method of lithographic printing plate | FUJIFILM CORPORATION (JP) | 2017-01-03 | — | — | US | disclosed |
| CN-102614943-B | Synthetic for the sequester resin of the water treatment of light-water reactor | ELECTRIC POWER RESEARCH INSTITUTE, INC. (US) | 2016-05-18 | — | — | CN | disclosed |
| US-20150198878-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD OF LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2015-07-16 | — | — | US | disclosed |
| CN-102614943-A | Synthesis of sequestration resins for water treatment in light water reactors | ELECTRIC POWER RES INST | 2012-08-01 | — | — | CN | disclosed |
| US-6986960-B2 | Poly (arylene ether sulfone) having sulfoalkoxy group, process of producing the same, and polymer electrolyte membrane comprising the same | TOSOH CORPORATION (JP) | 2006-01-17 | — | — | US | disclosed |
| EP-1314751-B1 | Poly(arylene ether sulfone) having sulfoalkoxy group, process of producing the same, and polymer electrolyte membrane comprising the same | TOSOH CORP (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-20030104259-A1 | Poly(arylene ether sulfone) having sulfoalkoxy group, process of producing the same, and polymer electrolyte membrane comprising the same | TOSOH CORPORATION | 2003-06-05 | — | — | US | disclosed |
| EP-1314751-A1 | Poly(arylene ether sulfone) having sulfoalkoxy group, process of producing the same, and polymer electrolyte membrane comprising the same | Tosoh Corporation (JP) | 2003-05-28 | — | — | EP | disclosed |