⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phenol SCHEMBL28356434 | 0.96 | CA14 (0.79) | — | |
| Phenol SCHEMBL8197719 | 0.96 | CA14 (0.79) | — | |
| Phenol SCHEMBL10910433 | 0.92 | CA14 (0.85) | — | |
| Phenol SCHEMBL7698697 | 0.92 | — | — | |
| Phenol SCHEMBL11067860 | 0.92 | CA12 (1.00) | — | |
| Phenol SCHEMBL524026 | 0.92 | CA12 (1.00) | — | |
| Phenol SCHEMBL7750141 | 0.92 | CA12 (1.00) | — | |
| Phenol SCHEMBL9470299 | 0.92 | CA12 (1.00) | — | |
| Phenol SCHEMBL28575 | 0.92 | CA12 (1.00) | — | |
| Phenol SCHEMBL8825085 | 0.92 | CA12 (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115612149-A | Conductive silicone rubber and preparation method thereof | 深圳市飞荣达科技股份有限公司 | 2023-01-17 | — | — | CN | claimed |
| CN-112980374-B | Two-component silane modified sealant and preparation method thereof | 杭州之江新材料有限公司 | 2022-12-30 | — | — | CN | claimed |
| CN-113621137-B | Preparation method of cyclophosphazenitrile polyimine vitrimer and application of same in preparation of epoxy resin and polyurethane material | 北京化工大学 | 2022-10-18 | — | — | CN | claimed |
| CN-113621137-A | Preparation method of cyclophosphazenil polyimine vitrimer and application of cyclophosphazenil polyimine vitrimer in preparation of epoxy resin and polyurethane material | 北京化工大学 | 2021-11-09 | — | — | CN | claimed |
| CN-112980374-A | Two-component silane modified sealant and preparation method thereof | 杭州之江新材料有限公司 | 2021-06-18 | — | — | CN | claimed |
| CN-104804493-A | Pollution-resistant coating | QINGDAO BAOLIKANG NEW MATERIAL CO LTD | 2015-07-29 | — | — | CN | claimed |
| CN-104789071-A | Improved anti-pollution paint | QINGDAO BAIQIANCHUAN MARINE ECOLOGY TECHNOLOGY CO LTD | 2015-07-22 | — | — | CN | claimed |
| CN-101007922-B | Nano zinc aluminum modified epoxy-fluorocarbon coating | SHENYANG QINGCHEN CORROSIONPROOF ENGINEERING TECHNOLOGY CO LTD | 2010-05-12 | — | — | CN | claimed |
| US-5180397-A | Hair dyes | L'OREAL (FR) | 1993-01-19 | — | — | US | claimed |
| JP-62245252-A | — | — | None | — | — | JP | disclosed |
| CN-116925686-A | Silane modified bi-component flame retardant adhesive and preparation method thereof | 杭州之江有机硅化工有限公司 | 2023-10-24 | — | — | CN | disclosed |
| CN-115785764-A | Quick-drying protective coating for ships and preparation method thereof | 上海海隆赛能新材料有限公司 | 2023-03-14 | — | — | CN | disclosed |
| CN-115612149-A | Conductive silicone rubber and preparation method thereof | 深圳市飞荣达科技股份有限公司 | 2023-01-17 | — | — | CN | disclosed |
| CN-112980374-B | Two-component silane modified sealant and preparation method thereof | 杭州之江新材料有限公司 | 2022-12-30 | — | — | CN | disclosed |
| EP-1014178-B1 | Photothermographic or thermographic material | FUJI PHOTO FILM CO LTD (JP) | 2004-12-01 | — | — | EP | disclosed |
| CN-1085990-C | Improved surface treatment of polymers | COMMW SCIENT IND RES ORG (AU) | 2002-06-05 | — | — | CN | disclosed |
| EP-1014178-A1 | Photothermographic or thermographic material | FUJI PHOTO FILM CO., LTD. (JP) | 2000-06-28 | — | — | EP | disclosed |
| CN-1192224-A | Improved polymer surface treatment process | COMMW SCIENT IND RES ORG (AU) | 1998-09-02 | — | — | CN | disclosed |
| US-5349088-A | Reaction of ketone or aldehyde with hydroxylamine in presence of alkylphenol phase transfer catalyst | HENKEL CORPORATION (US) | 1994-09-20 | — | — | US | disclosed |
| JP-S62245252-A | IMAGE FORMING METHOD | FUJI PHOTO FILM CO LTD | 1987-10-26 | — | — | JP | disclosed |