SCHEMBL603161

SCHEMBL603161

CC(=CC=CC#N)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 1/20 0.38
HDAC4 P56524 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38
HDAC2 Q92769 1/20 0.38
HDAC10 Q969S8 1/20 0.38
HDAC11 Q96DB2 1/20 0.38
HDAC8 Q9BY41 1/20 0.38
HDAC6 Q9UBN7 1/20 0.38
HDAC9 Q9UKV0 1/20 0.38
HDAC5 Q9UQL6 1/20 0.38
KDM1A O60341 1/20 0.37
PDE4A P27815 1/20 0.37
PDE4B Q07343 1/20 0.37
PDE4C Q08493 1/20 0.37
PDE4D Q08499 1/20 0.37
POLB P06746 2/20 0.33
CES2 O00748 1/20 0.33
CES1 P23141 1/20 0.33
ALDH1A1 P00352 4/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9864474 0.83 HDAC3 (0.34) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL9863558 0.80 HDAC3 (0.33) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL6900954 0.76 KDM1A (0.48) KDM1ACES2CES1ALDH1A1MAPT
SCHEMBL11206059 0.76 KDM1A (0.48) KDM1ACES2CES1ALDH1A1MAPT
SCHEMBL23458237 0.76 KDM1A (0.48) KDM1ACES2CES1ALDH1A1MAPT
SCHEMBL23458124 0.76 KDM1A (0.48) KDM1ACES2CES1ALDH1A1MAPT
SCHEMBL19749017 0.76 AKT1 (0.39) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL11349870 0.75 KDM1A (0.41) KDM1APOLBCES2CES1ALDH1A1
SCHEMBL8548467 0.75 PDE4A (0.49) KDM1APDE4APDE4BPDE4CPDE4D
SCHEMBL19891767 0.75 KDM1A (0.41) KDM1APOLBCES2CES1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 226 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8569415-B2 Graft copolymer, thermoplastic resin composition and molded product MITSUBISHI RAYON CO., LTD. (JP) 2013-10-29 US claimed
EP-1325076-B8 THERMOPLASTIC MOULDING MATERIALS CONTAINING ADDITIVE MIXTURES INEOS ABS JERSEY LTD (GB) 2008-04-16 EP claimed
EP-1325076-A2 THERMOPLASTIC MOULDING MATERIALS CONTAINING ADDITIVE MIXTURES Bayer Aktiengesellschaft (DE) 2003-07-09 EP claimed
US-6399292-B2 A MATTING AGENT HAVING A SOFTENING TEMPERATURE OF FROM 100 TO 500 DEGREES C. IS CONTAINED AT LEAST ON ONE SIDE OF THE SUPPORT. FUJI PHOTO FILM CO., LTD. (JP) 2002-06-04 US claimed
WO-2002024805-A2 THERMOPLASTIC MOULDING MATERIALS CONTAINING ADDITIVE MIXTURES BAYER AKTIENGESELLSCHAFT (DE) 2002-03-28 WO claimed
US-20020015924-A1 PHOTOTHERMOGRAPHIC PHOTOSENSITIVE MATERIAL AND PHOTOTHEMOGRAPHIIC METHOD FUJIFILM CORPORATION (JP) 2002-02-07 US claimed
EP-0222924-B1 PROCESS FOR PRODUCING MALEIMIDE COPOLYMER AND THERMOPLASTIC RESIN COMPOSITION COMPRISING THE COPOLYMER MITSUBISHI RAYON CO., LTD. (JP) 1992-12-09 EP claimed
US-4404322-A Heat resistant resin composition DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1983-09-13 US claimed
US-4021245-A GELATION DERIVATIVE, SILICIC ACID ANHYDRIDE FUJI PHOTO FILM CO., LTD. (JA) 1977-05-03 US claimed
US-6423486-B1 None US disclosed
EP-3438197-B1 THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE IN WHICH THE SAME IS USED TECHNO UMG CO LTD (JP) 2024-05-15 EP disclosed
US-11326104-B2 Process for preparing flame retardant compositions CHESTNUT SPRINGS LLC (US) 2022-05-10 US disclosed
US-11248080-B2 Brominated flame retardant BASF SE (DE) 2022-02-15 US disclosed
CN-112673141-A Building material board and method for manufacturing building 株式会社钟化 2021-04-16 CN disclosed
US-4096137-A AZOLE-CONTAINING SULFONYL OR CARBONYL GROUP FUJI PHOTO FILM CO., LTD. (JA) 1978-06-20 US disclosed
US-4066636-A METHOD OF HARDENING GELATIN FUJI PHOTO FILM CO., LTD. (JA) 1978-01-03 US disclosed
US-4052373-A O-AMINOESTER FUJI PHOTO FILM CO., LTD. (JA) 1977-10-04 US disclosed
US-4028320-A Method of hardening gelatin using sulfonyl compounds FUJII PHOTO FILM CO., LTD. (JA) 1977-06-07 US disclosed
US-4021245-A GELATION DERIVATIVE, SILICIC ACID ANHYDRIDE FUJI PHOTO FILM CO., LTD. (JA) 1977-05-03 US disclosed
US-4021244-A Silver halide photographic materials with surface layers comprising both alkali and acid produced gelatin FUJI PHOTO FILM CO., LTD. (JA) 1977-05-03 US disclosed