⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8541431 | 0.82 | — | — | |
| SCHEMBL19640327 | 0.77 | — | — | |
| SCHEMBL1276019 | 0.77 | — | — | |
| SCHEMBL766598 | 0.76 | — | — | |
| SCHEMBL8500122 | 0.76 | — | — | |
| SCHEMBL8500112 | 0.76 | — | — | |
| SCHEMBL8541901 | 0.73 | — | — | |
| SCHEMBL15264400 | 0.73 | — | — | |
| SCHEMBL767232 | 0.73 | — | — | |
| SCHEMBL766992 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 378 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-118159910-A | Additive-containing silicon-containing resist underlayer film forming composition | 日产化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-113518762-B | Release layer dispersion of layered compound and transparent substrate using the same | 公立大学法人大阪 | 2024-05-28 | — | — | CN | disclosed |
| CN-112239407-B | Diester compound having dimethylcyclobutane ring, method for producing the same, and method for producing dimethylcyclobutane compound derived from the same | 信越化学工业株式会社 | 2024-05-28 | — | — | CN | disclosed |
| US-20240162086-A1 | SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-05-16 | — | — | US | disclosed |
| CN-114341232-B | Process for producing silicon-containing polymer composition | 日产化学株式会社 | 2024-05-07 | — | — | CN | disclosed |
| CN-117940850-A | Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| US-11966164-B2 | Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| WO-2024078971-A1 | HEAT-SENSITIVE RECORDING MATERIAL | KOEHLER INNOVATION & TECHNOLOGY GMBH (DE) | 2024-04-18 | — | — | WO | disclosed |
| EP-0945445-B9 | 1,5-BENZODIAZEPINE DERIVATIVES | ZERIA PHARM CO LTD (JP) | 2005-12-28 | — | — | EP | disclosed |
| US-20040039208-A1 | Process for making n-aryl-anthranilic acids and their derivatives | CHEN MICHAEL HUAI GU (US) | 2004-02-26 | — | — | US | disclosed |
| EP-0945445-B1 | 1,5-BENZODIAZEPINE DERIVATIVES | ZERIA PHARM CO LTD (JP) | 2003-09-03 | — | — | EP | disclosed |
| EP-1313694-A1 | PROCESS FOR MAKING N-ARYL-ANTHRANILIC ACIDS AND THEIR DERIVATIVES | WARNER-LAMBERT COMPANY (US) | 2003-05-28 | — | — | EP | disclosed |
| WO-2002018319-A1 | PROCESS FOR MAKING N-ARYL-ANTHRANILIC ACIDS AND THEIR DERIVATIVES | WARNER-LAMBERT COMPANY LLC (US) | 2002-03-07 | — | — | WO | disclosed |
| US-6239131-B1 | WHICH HAVE GASTRIN AND/OR CCK-B (CHOLECYSTOKININ-B) RECEPTOR ANTAGONISM, USEFUL AS REMEDIES FOR GASTRIC ULCER AND GASTROINTESTINAL MOVEMENT DISORDER. | ZERIA PHARMACEUTICAL CO., LTD. (JP) | 2001-05-29 | — | — | US | disclosed |
| US-6174839-B1 | AS HERBICIDE | NIHON BAYER AGROCHEM K.K. (JP) | 2001-01-16 | — | — | US | disclosed |
| EP-0945445-A1 | 1,5-BENZODIAZEPINE DERIVATIVES | ZERIA PHARMACEUTICAL CO., LTD. (JP) | 1999-09-29 | — | — | EP | disclosed |
| US-5935907-A | HERBICIDES | NIHON BAYER AGROCHEM K.K. (JP) | 1999-08-10 | — | — | US | disclosed |
| EP-0869123-A2 | Phenylacetylene derivatives | NIHON BAYER AGROCHEM K.K. (JP) | 1998-10-07 | — | — | EP | disclosed |