Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 4/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.56 |
| ▸ | CYP1B1 | Q16678 | 3/20 | 0.54 |
| ▸ | CYP1A1 | P04798 | 2/20 | 0.54 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.54 |
| ▸ | RAB9A | P51151 | 2/20 | 0.53 |
| ▸ | TNKS | O95271 | 1/20 | 0.53 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.53 |
| ▸ | NPC1 | O15118 | 1/20 | 0.53 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.50 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.47 |
| ▸ | ABCG2 | Q9UNQ0 | 2/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.45 |
| ▸ | MAOA | P21397 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29488292 | 1.00 | ESR1 (0.56) | ESR1ESR2CYP1B1CYP1A1CYP1A2 | |
| SCHEMBL29058865 | 0.85 | ESR1 (0.64) | ESR1ESR2RXFP1ALDH1A1ADORA3 | |
| SCHEMBL26462184 | 0.85 | ESR1 (0.68) | ESR1ESR2CYP1A2RAB9AALDH1A1 | |
| SCHEMBL28202404 | 0.84 | CYP1B1 (0.45) | ESR1ESR2CYP1B1CYP1A1CYP1A2 | |
| SCHEMBL29514776 | 0.84 | ESR1 (0.73) | ESR1ESR2CYP1A2RAB9AALDH1A1 | |
| SCHEMBL194068 | 0.84 | ESR1 (0.73) | ESR1ESR2CYP1A2RAB9AALDH1A1 | |
| SCHEMBL18904925 | 0.83 | CYP1B1 (0.54) | ESR1ESR2CYP1B1CYP1A1CYP1A2 | |
| SCHEMBL261051 | 0.82 | MAPK1 (0.67) | ESR1ESR2CYP1B1CYP1A1CYP1A2 | |
| Ammonia Solution, Strong SCHEMBL28289396 | 0.82 | ESR1 (0.70) | ESR1ESR2CYP1A2RAB9AALDH1A1 | |
| SCHEMBL30114969 | 0.82 | MAPK1 (0.67) | ESR1ESR2CYP1B1CYP1A1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-111752097-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752100-A | Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752098-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-110357989-A | Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application | 常州强力电子新材料股份有限公司 | 2019-10-22 | — | — | CN | claimed |
| CN-109976095-A | It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light | 杭州福斯特应用材料股份有限公司 | 2019-07-05 | — | — | CN | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | claimed |
| EP-4067998-B1 | EO/PO MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS FOR USE IN PHOTOSENSITIVE RESINS IN THE MANUFACTURE OF PRINTED CIRCUIT BOARDS | CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD (CN) | 2025-11-12 | — | — | EP | disclosed |
| US-12353130-B2 | Photosensitive resin composition and photosensitive resin multilayer body | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| US-20240408595-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-12-12 | — | — | US | disclosed |
| US-12032286-B2 | Method for producing multi-layered type microchannel device using photosensitive resin laminate | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-07-09 | — | — | US | disclosed |
| CN-118119565-A | Structure having micro-channel, method for manufacturing same, and micro-channel device | 旭化成株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-101407492-A | Nitrogen-containing heterocyclic derivative and organic electroluminescent element using same | IDEMITSU KOSAN CO (JP) | 2009-04-15 | — | — | CN | disclosed |
| CN-101219987-A | Nitrogen-containing heterocyclic derivative and organic electroluminescent element using same | IDEMITSU KOSAN CO (JP) | 2008-07-16 | — | — | CN | disclosed |
| CN-1945429-A | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K (JP) | 2007-04-11 | — | — | CN | disclosed |
| CN-1751024-A | Nitrogen-containing heterocyclic derivative and organic electroluminescent element using same | IDEMITSU KOSAN CO (JP) | 2006-03-22 | — | — | CN | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | disclosed |