SCHEMBL6033245

SCHEMBL6033245

COC1(C)C=CC=CC1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28795124 0.83
SCHEMBL30434679 0.83
SCHEMBL8641998 0.77
SCHEMBL8930827 0.76
SCHEMBL1430241 0.74
SCHEMBL4180250 0.74
SCHEMBL29638849 0.74
SCHEMBL9011870 0.74
SCHEMBL30801356 0.74
SCHEMBL23647342 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026100443-A1 RESIN, COMPOSITION, PHOTOCROSSLINKED PRODUCT, AND ELECTRONIC DEVICE COMPRISING SAME 東ソー株式会社 2026-05-15 WO disclosed
EP-4421851-B1 RESIN, INSULATING FILM AND ORGANIC FIELD EFFECT TRANSISTOR COMPRISING SAME TOSOH CORP (JP) 2026-04-22 EP disclosed
US-20260098115-A1 RESIN, COMPOSITION, PHOTOCROSSLINKED PRODUCT, PATTERN, AND ELECTRONIC DEVICE COMPRISING SAME TOSOH CORPORATION (JP) 2026-04-09 US disclosed
US-20260013312-A1 PHOTOSENSITIVE ORGANIC INSULATING MATERIAL COMPOSITION, INSULATING FILM, GATE INSULATING FILM, TRANSISTOR, ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING TRANSISTOR NIKON CORPORATION (JP) 2026-01-08 US disclosed
EP-4317225-B1 FLUORINE RESIN, COMPOSITION, PHOTOCROSSLINKED PRODUCT, AND ELECTRONIC DEVICE PROVIDED THEREWITH TOSOH CORP (JP) 2025-12-10 EP disclosed
EP-4647432-A1 AROMATIC COMPOUND, ORGANIC SEMICONDUCTOR LAYER, AND ORGANIC THIN FILM TRANSISTOR Tosoh Corporation (JP) 2025-11-12 EP disclosed
EP-4596592-A1 RESIN, COMPOSITION, PHOTOCROSSLINKED PRODUCT, PATTERN, AND ELECTRONIC DEVICE COMPRISING SAME Tosoh Corporation (JP) 2025-08-06 EP disclosed
CN-120040272-A Method for producing m-ethyl anisole and p-ethyl anisole by using xylenol oil 煤炭科学技术研究院有限公司 2025-05-27 CN disclosed
CN-119948073-A Resin, composition, photocrosslinked product, pattern and electronic device provided with same 东曹株式会社 2025-05-06 CN disclosed
US-12291587-B2 Photocrosslinkable polymer, insulating film, planarization film, lyophilic/liquid repellent patterned film, and organic field effect transistor device comprising same TOSOH CORPORATION (JP) 2025-05-06 US disclosed
CN-110418808-B Photocrosslinkable polymer, insulating film, planarizing film, lyophilic-lyophilic patterned film, and organic field effect transistor device comprising same 东曹株式会社 2022-07-15 CN disclosed
US-20220059768-A1 COMPOSITION CONTAINING ORGANIC SEMICONDUCTOR, SOLUTION FOR FORMING ORGANIC SEMICONDUCTOR LAYER, ORGANIC SEMICONDUCTOR LAYER, AND ORGANIC THIN FILM TRANSISTOR TOSOH CORPORATION (JP) 2022-02-24 US disclosed
EP-3902023-A1 COMPOSITION CONTAINING ORGANIC SEMICONDUCTOR, SOLUTION FOR FORMING ORGANIC SEMICONDUCTOR LAYER, ORGANIC SEMICONDUCTOR LAYER, AND ORGANIC THIN FILM TRANSISTOR Tosoh Corporation (JP) 2021-10-27 EP disclosed
CN-113196512-A Composition containing organic semiconductor, solution for forming organic semiconductor layer, and organic thin film transistor 东曹株式会社 2021-07-30 CN disclosed
US-20210135115-A1 PHOTOCROSSLINKABLE POLYMER, INSULATING FILM, PLANARIZATION FILM, LYOPHILIC/LIQUID REPELLENT PATTERNED FILM, AND ORGANIC FIELD EFFECT TRANSISTOR DEVICE COMPRISING SAME TOSOH CORPORATION (JP) 2021-05-06 US disclosed
EP-3541803-B1 TRIAZOLE PYRIDYL COMPOUNDS AS AGONISTS OF THE APJ RECEPTOR AMGEN INC (US) 2020-12-23 EP disclosed
CN-110418808-A Photocrosslinking reaction polymer, insulating film, planarization film, close and distant patterned film and the organic field effect tube device comprising it TOSOH CORP 2019-11-05 CN disclosed
WO-2019181954-A1 POLYMERIZABLE COMPOUND, PHOTOCURABLE POLYMER, INSULATING FILM, PROTECTIVE FILM, AND ORGANIC TRANSISTOR DEVICE 東ソー株式会社 2019-09-26 WO disclosed
US-20060045959-A1 Method of manufacturing electron device and organic electroluminescent display and ink for organic amorphous film HITACHI DISPLAYS, LTD. (JP) 2006-03-02 US disclosed
US-5208384-A Electrochemical oxidation and etherification BASF AKTIENGESELLSCHAFT (DE) 1993-05-04 US disclosed