SCHEMBL6037460

SCHEMBL6037460

CCCCCCCCCCCCC(C)(C)O[SiH3]

nearest known ligand 0.42

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.42
THRB P10828 1/20 0.42
CES2 O00748 1/20 0.40
GGPS1 O95749 6/20 0.38
SMPD1 P17405 5/20 0.38
FDPS P14324 9/20 0.37
LPAR1 Q92633 1/20 0.35
LPAR3 Q9UBY5 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5843470 1.00 TSHR (0.42) TSHRTHRBCES2GGPS1SMPD1
SCHEMBL9016161 1.00 TSHR (0.42) TSHRTHRBCES2GGPS1SMPD1
SCHEMBL4534259 1.00 TSHR (0.42) TSHRTHRBCES2GGPS1SMPD1
SCHEMBL159036 1.00 TSHR (0.42) TSHRTHRBCES2GGPS1SMPD1
SCHEMBL6037294 1.00 TSHR (0.42) TSHRTHRBCES2GGPS1SMPD1
SCHEMBL6037308 1.00 TSHR (0.42) TSHRTHRBCES2GGPS1SMPD1
SCHEMBL236669 1.00 TSHR (0.42) TSHRTHRBCES2GGPS1SMPD1
SCHEMBL10603829 1.00 TSHR (0.42) TSHRTHRBCES2GGPS1SMPD1
SCHEMBL5843389 1.00 TSHR (0.42) TSHRTHRBCES2GGPS1SMPD1
SCHEMBL6241640 1.00 TSHR (0.42) TSHRTHRBCES2GGPS1SMPD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9997755-B2 Separator comprising a porous layer and method for producing said separator SIHL GMBH (DE) 2018-06-12 US disclosed
EP-2805366-B1 SEPARATOR COMPRISING A POROUS LAYER AND A PROCEDURE FOR ITS PREPARATION SIHL GMBH (DE) 2016-08-24 EP disclosed
US-20150030933-A1 SEPARATOR COMPRISING A POROUS LAYER AND METHOD FOR PRODUCING SAID SEPARATOR SIHL GMBH (DE) 2015-01-29 US disclosed
EP-2805366-A1 SEPARATOR COMPRISING A POROUS LAYER AND METHOD FOR PRODUCING SAID SEPARATOR Sihl GmbH (DE) 2014-11-26 EP disclosed
US-8586485-B2 Molecular self-assembly in substrate processing INTERMOLECULAR, INC. (US) 2013-11-19 US disclosed
WO-2013107911-A1 SEPARATOR COMPRISING A POROUS LAYER AND METHOD FOR PRODUCING SAID SEPARATOR SIHL GMBH (DE) 2013-07-25 WO disclosed
US-20060222869-A1 Electropen lithography ENERGY, UNITED STATES DEPARTMENT 2006-10-05 US disclosed