⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL5152359 | 0.95 | — | — | |
| SCHEMBL10382187 | 0.95 | — | — | |
| Fluoride Ion SCHEMBL4617213 | 0.95 | — | — | |
| Water SCHEMBL2817747 | 0.95 | — | — | |
| SCHEMBL21107989 | 0.80 | — | — | |
| Bicarbonate SCHEMBL9503263 | 0.78 | TP53 (0.37) | — | |
| SCHEMBL8200971 | 0.78 | MEN1 (0.38) | — | |
| SCHEMBL144709 | 0.74 | — | — | |
| SCHEMBL5142546 | 0.74 | — | — | |
| SCHEMBL6682725 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1266956-B1 | Composition for washing a polishing pad and method for washing a polishing pad | JSR CORP (JP) | 2006-04-19 | — | — | EP | claimed |
| EP-0269949-B1 | PROCESS FOR PRODUCING A HIGH PURITY QUATERNARY AMMONIUM HYDROXIDE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1993-04-21 | — | — | EP | claimed |
| US-4776929-A | Process for production of quaternary ammonium hydroxides | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1988-10-11 | — | — | US | claimed |
| EP-0269949-A2 | Process for producing a high purity quaternary ammonium hydroxide | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1988-06-08 | — | — | EP | claimed |
| US-6384179-B1 | — | — | None | — | — | US | disclosed |
| CN-109385037-B | Polyoxymethylene resin composition | 旭化成株式会社 | 2022-10-04 | — | — | CN | disclosed |
| US-11201321-B1 | LimMOxFy shell formation on cathode ceramic particle for Li ion battery through onium metal oxide fluoride precursor | SACHEM, INC. (US) | 2021-12-14 | — | — | US | disclosed |
| US-20210367227-A1 | LimMOxFy SHELL FORMATION ON CATHODE CERAMIC PARTICLE FOR LI ION BATTERY THROUGH ONIUM METAL OXIDE FLUORIDE PRECURSOR | SACHEM, INC. | 2021-11-25 | — | — | US | disclosed |
| EP-3492450-B1 | QUATERNARY AMMONIUM COMPOUND AND SUPPRESSION OF GENERATION OF VOLATILE ORGANIC COMPOUND FROM POLYACETAL UTILIZING SAME | ASAHI CHEMICAL IND (JP) | 2021-10-13 | — | — | EP | disclosed |
| CN-112106232-A | LimMOxFy shell formation on cathode ceramic particles for lithium ion batteries by onium metal oxyfluoride precursors | 塞克姆公司 | 2020-12-18 | — | — | CN | disclosed |
| US-10815190-B2 | Quaternary ammonium compound, and agent for suppression of generation of volatile organic compound from polyacetal by use of the same | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-10-27 | — | — | US | disclosed |
| EP-3714502-A1 | LimMOxFy SHELL FORMATION ON CATHODE CERAMIC PARTICLE FOR LI ION BATTERY THROUGH ONIUM METAL OXIDE FLUORIDE PRECURSOR | Sachem, Inc. (US) | 2020-09-30 | — | — | EP | disclosed |
| US-6365655-B1 | SUBJECTING AN OXYMETHYLENE COPOLYMER HAVING THERMALLY UNSTABLE TERMINAL GROUPS TO HEAT TREATMENT IN THE PRESENCE OF AT LEAST ONE QUATERNARY AMMONIUM COMPOUND FOR STABILIZATION | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 2002-04-02 | — | — | US | disclosed |
| US-20010034407-A1 | Thermoplastic resin integrated structure | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010007006-A1 | Polyacetal resin composition | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2001-07-05 | — | — | US | disclosed |
| US-5576459-A | Quaternary nitrogen or phosphorus chirates | SACHEM, INC. (US) | 1996-11-19 | — | — | US | disclosed |
| EP-0269949-B1 | PROCESS FOR PRODUCING A HIGH PURITY QUATERNARY AMMONIUM HYDROXIDE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1993-04-21 | — | — | EP | disclosed |
| US-4776929-A | Process for production of quaternary ammonium hydroxides | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1988-10-11 | — | — | US | disclosed |
| EP-0269949-A2 | Process for producing a high purity quaternary ammonium hydroxide | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1988-06-08 | — | — | EP | disclosed |
| US-4556629-A | Developer composition for positive photoresists using solution with cyclic quaternary ammonium hydroxides | MORTON THIOKOL, INC. (US) | 1985-12-03 | — | — | US | disclosed |