Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | STAT3 | P40763 | 2/20 | 0.50 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.44 |
| ▸ | SIRT5 | Q9NXA8 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | NR1D1 | P20393 | 1/20 | 0.42 |
| ▸ | ENPP3 | O14638 | 2/20 | 0.39 |
| ▸ | ENPP1 | P22413 | 2/20 | 0.39 |
| ▸ | ENPP2 | Q13822 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | PSEN1 | P49768 | 1/20 | 0.38 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.38 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.38 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.38 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.38 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10738018 | 0.91 | STAT3 (0.49) | STAT3CTDSP1SIRT5KMT2AALDH1A1 | |
| SCHEMBL13411267 | 0.87 | STAT3 (0.42) | STAT3CTDSP1SIRT5KMT2AALDH1A1 | |
| SCHEMBL14129506 | 0.86 | STAT3 (0.41) | STAT3CTDSP1SIRT5KMT2AALDH1A1 | |
| SCHEMBL30244778 | 0.86 | STAT3 (0.41) | STAT3CTDSP1SIRT5KMT2AALDH1A1 | |
| SCHEMBL18640035 | 0.86 | STAT3 (0.41) | STAT3CTDSP1SIRT5KMT2AALDH1A1 | |
| SCHEMBL17823004 | 0.86 | STAT3 (0.41) | STAT3CTDSP1SIRT5KMT2AALDH1A1 | |
| SCHEMBL15874980 | 0.86 | STAT3 (0.41) | STAT3CTDSP1SIRT5KMT2AALDH1A1 | |
| SCHEMBL30751227 | 0.86 | STAT3 (0.41) | STAT3CTDSP1SIRT5KMT2AALDH1A1 | |
| SCHEMBL18666654 | 0.85 | STAT3 (0.41) | STAT3CTDSP1SIRT5KMT2AALDH1A1 | |
| SCHEMBL18530388 | 0.85 | STAT3 (0.41) | STAT3CTDSP1SIRT5KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 709 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240077802-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-07 | — | — | US | claimed |
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | claimed |
| US-11626293-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-04-11 | — | — | US | claimed |
| US-20220230889-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-07-21 | — | — | US | claimed |
| US-20150024326-A1 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | KAYAKU ADVANCED MATERIALS, INC. | 2015-01-22 | — | — | US | claimed |
| US-8759415-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-06-24 | — | — | US | claimed |
| US-8557943-B2 | Nanostructured organosilicates from thermally curable block copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | claimed |
| WO-2013134104-A2 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | MICROCHEM CORP. (US) | 2013-09-12 | — | — | WO | claimed |
| US-8426113-B2 | Chemically amplified silsesquioxane resist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-04-23 | — | — | US | claimed |
| US-20120291668-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-22 | — | — | US | claimed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| US-20120040289-A1 | CHEMICALLY AMPLIFIED SILSESQUIOXANE RESIST COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-02-16 | — | — | US | claimed |
| US-20080174051-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-24 | — | — | US | claimed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | claimed |
| US-20070298176-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2007-12-27 | — | — | US | claimed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | claimed |
| US-20060183055-A1 | Method for defining a feature on a substrate | VERSUM MATERIALS US, LLC | 2006-08-17 | — | — | US | claimed |
| EP-1691410-A2 | Method for defining a feature on a substrate | Air Products and Chemicals, Inc. (US) | 2006-08-16 | — | — | EP | claimed |
| US-6365321-B1 | COPOLYMER WITH ACRYLATE HAVING ACID LABILE GROUP, HOMOGENOUSLY BLENDED WITH PHENOLIC POLYMER WHICH IS PARTIALLY OR WHOLLY PROTECTED | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-04-02 | — | — | US | claimed |
| US-6083697-A | Chemical amplification for the synthesis of patterned arrays | AFFYMETRIX, INC. (US) | 2000-07-04 | — | — | US | claimed |