⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6250433 | 0.61 | — | — | |
| SCHEMBL1462445 | 0.50 | — | — | |
| SCHEMBL6739206 | 0.41 | — | — | |
| SCHEMBL9281300 | 0.41 | — | — | |
| SCHEMBL28187572 | 0.41 | — | — | |
| SCHEMBL9442113 | 0.41 | — | — | |
| SCHEMBL27797375 | 0.41 | — | — | |
| SCHEMBL29808296 | 0.29 | — | — | |
| SCHEMBL29264 | 0.29 | — | — | |
| Hydrogen Peroxide SCHEMBL528 | 0.29 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113995758-B | Application of carbazole-pyrimidine derivative in preparation of antitumor drugs | 中山大学 | 2023-06-02 | — | — | CN | disclosed |
| US-20150177618-A1 | Method for on-press developable lithographic plate utilizing light-blocking material | TENG GARY GANGHUI (US) | 2015-06-25 | — | — | US | disclosed |
| US-8623586-B2 | Method for on-press developable lithographic plate utilizing light-blocking material | TENG GARY GANGHUI (US) | 2014-01-07 | — | — | US | disclosed |
| US-8314215-B2 | Mild chemically cleavable linker system | THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY (US) | 2012-11-20 | — | — | US | disclosed |
| US-8146495-B2 | Deactivating device and method for lithographic plate | TENG GARY GANGHUI (US) | 2012-04-03 | — | — | US | disclosed |
| US-8129090-B2 | Process for on-press developable lithographic printing plate involving preheat | TENG GARY GANGHUI (US) | 2012-03-06 | — | — | US | disclosed |
| US-20110277654-A1 | Device and method for treating lithographic printing plate | TENG GARY GANGHUI (US) | 2011-11-17 | — | — | US | disclosed |
| US-7966934-B2 | Process for on-press developing overcoat-free lithographic printing plate | TENG GARY GANGHUI | 2011-06-28 | — | — | US | disclosed |
| US-7874249-B2 | Deactivating device and method for lithographic printing plate | TENG GARY GANGHUI | 2011-01-25 | — | — | US | disclosed |
| US-20100216074-A1 | Method for on-press developable lithographic plate utilizing light-blocking material | TENG GARY GANGHUI | 2010-08-26 | — | — | US | disclosed |
| US-4252884-A | DIAZONIUM SALT, BLOCKED PHENOLIC COUPLER | JAMES RIVER GRAPHICS, INC. (US) | 1981-02-24 | — | — | US | disclosed |
| US-4139384-A | Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate | FUJI PHOTO FILM CO., LTD. (JP) | 1979-02-13 | — | — | US | disclosed |
| US-4139384-A | Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate | FUJI PHOTO FILM CO., LTD. (JP) | 1979-02-13 | — | — | US | disclosed |
| US-4108664-A | Light-sensitive negative-working film containing a diazo oxide sensitizer and a p-toluenesulfonyl halide or a 2,4-dihalo-S-triazine | GAF CORPORATION (US) | 1978-08-22 | — | — | US | disclosed |
| US-4104072-A | Water developable lithographic printing plate having dual photosensitive layering | POLYCHROME CORPORATION (US) | 1978-08-01 | — | — | US | disclosed |
| US-4102686-A | DURABLE PHOTORESIST, LONG RUNNING OFFSET PRINTING PLATE | POLYCHROME CORPORATION (US) | 1978-07-25 | — | — | US | disclosed |
| US-4094681-A | Image amplification of negative-working diazo materials | TRANS WORLD TECHNOLOGY LABORATORIES, INC. (US) | 1978-06-13 | — | — | US | disclosed |
| US-4086092-A | Process for making photosensitive lithographic printing plates involving sequentially coating with potassium zirconium fluoride and sodium silicate | POLYCHROME CORPORATION (US) | 1978-04-25 | — | — | US | disclosed |
| US-4080246-A | PHOSPHORIC ACID, PERCHLORIC COMPOUND, WATER, AND A WETTING AGENT, ETCHING ALUMINUM OR ITS ALLOYS | GAF CORPORATION (US) | 1978-03-21 | — | — | US | disclosed |
| US-3953212-A | SILICONE RUBBERS | FUJI PHOTO FILM CO., LTD. (JA) | 1976-04-27 | — | — | US | disclosed |