SCHEMBL607695

SCHEMBL607695

COC1CCCCCCC1

nearest known ligand 0.38

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 3/20 0.38
▸ CA2 P00918 3/20 0.38
▸ ACHE P22303 1/20 0.37
▸ CA12 O43570 2/20 0.36
▸ CA9 Q16790 2/20 0.36
▸ EPHX1 P07099 2/20 0.34
▸ NPC1 O15118 2/20 0.33
▸ RAB9A P51151 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ NAAA Q02083 1/20 0.31
▸ ALDH1A1 P00352 2/20 0.31
▸ HTT P42858 1/20 0.30
▸ HSD17B10 Q99714 1/20 0.30
▸ KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL566961 1.00 — —
SCHEMBL21237759 1.00 CA1 (0.38) CA1CA2ACHECA12CA9
SCHEMBL40788 1.00 — —
Cyclohexane SCHEMBL15212796 1.00 CA1 (0.38) CA1CA2ACHECA12CA9
SCHEMBL112370 1.00 CA1 (0.38) CA1CA2ACHECA12CA9
SCHEMBL1472301 1.00 CA1 (0.38) CA1CA2ACHECA12CA9
Ammonia Solution, Strong SCHEMBL8076692 0.97 CA1 (0.36) CA1CA2ACHECA12CA9
Ammonia Solution, Strong SCHEMBL8083463 0.97 — —
Ammonia Solution, Strong SCHEMBL8078616 0.97 CA1 (0.36) CA1CA2ACHECA12CA9
Ammonia Solution, Strong SCHEMBL8069132 0.97 CA1 (0.36) CA1CA2ACHECA12CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 218 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117013085-A Weak solvation electrolyte and lithium-sulfur battery and lithium ion battery containing same 中国科学院苏州纳米技术与纳米仿生研究所 2023-11-07 — — CN claimed
EP-2648675-A1 HAIR RELAXING AND STRAIGHTENING COMPOSITIONS International Flora Technologies, Ltd. (US) 2013-10-16 — — EP claimed
US-20120148517-A1 Hair Relaxing and Straightening Compositions INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) 2012-06-14 — — US claimed
WO-2012078658-A1 HAIR RELAXING AND STRAIGHTENING COMPOSITIONS INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) 2012-06-14 — — WO claimed
US-7300741-B2 For printing features having a dimension of about 30 nm or less; resist is developable in an aqueous alkaline developer INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-11-27 — — US claimed
US-20070269736-A1 NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-11-22 — — US claimed
US-20070248908-A1 ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RESOLUTION INTERNATIONAL BUSINESS MACHINES (US) 2007-10-25 — — US claimed
US-20050106494-A1 Silicon-containing resist systems with cyclic ketal protecting groups INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2005-05-19 — — US claimed
US-6043003-A SOME OF THE POLAR FUNCTIONAL GROUPS OF THE AQUEOUS BASE SOLUBLE POLYMER OR COPOLYMERS ARE PROTECTED WITH A CYCLIC ALIPHATIC KETAL PROTECTING GROUP SUCH AS METHOXYCYCLOHEXANYL. INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2000-03-28 — — US claimed
US-6037097-A A CYCLIC ALIPHATIC KETAL SUBSTITUENT E.G. METHOXYCYCLOHEXANYL AS AN ACID-LABILE PROTECTING GROUP FOR AN AQUEOUS BASE SOLUBLE POLYMER, E.G. A POLYHYDROXYSTYRENE; SHELF-LIFE; VACUUM STABILITY INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2000-03-14 — — US claimed
EP-0932082-A2 Chemically amplified resist composition and method of creating a patterned resist using electron beam INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-07-28 — — EP claimed
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 — — US disclosed
CN-117377674-A Pyrazolo [1,5-a ] pyrimidine compounds for the treatment of dermatological disorders 大塚制药株式会社 2024-01-09 — — CN disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 — — CN disclosed
CN-117013085-A Weak solvation electrolyte and lithium-sulfur battery and lithium ion battery containing same 中国科学院苏州纳米技术与纳米仿生研究所 2023-11-07 — — CN disclosed
US-4070406-A 1-Phenyl-cyclooctadiene (1,5) STUDIENGESELLSCHAFT KOHLE M.B.H. (DT) 1978-01-24 — — US disclosed
US-4067918-A CROSSLINKING AGENTS STUDIENGESELLSCHAFT KOHLE M.B.H. (DT) 1978-01-10 — — US disclosed
US-4056552-A Ethyl 3,7-cyclodecadiene-1-carboxylate STUDIENGESELLSCHAFT KOHLE M.B.H. (DT) 1977-11-01 — — US disclosed
US-4052435-A CROSSLINKING AGENTS STUDIENGESELLSCHAFT KOHLE M.B.H. (DT) 1977-10-04 — — US disclosed
US-4032585-A CROSSLINKING AGENTS STUDIENGESELLSCHAFT KOHLE M.B.H. (DT) 1977-06-28 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120148517-A1 Hair Relaxing and Straightening Compositions PDE6G, SHH, DNMT3L CA1 1569/4885CA2 662/4885ACHE 623/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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