SCHEMBL609233

SCHEMBL609233

CC1CCCC1[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL601172 0.93
SCHEMBL5405664 0.93
SCHEMBL5405639 0.93
SCHEMBL5411013 0.81
SCHEMBL1379212 0.77
SCHEMBL5076529 0.76
SCHEMBL766992 0.74
SCHEMBL1832762 0.73
SCHEMBL597949 0.73
SCHEMBL4280450 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 339 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040119073-A1 Synthesis and application of photosensitive pentacene precursor in organic thin film transistors INTERNATIONAL BUSINESS MACHINES CORPORATION 2004-06-24 US claimed
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
US-20240201593-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
CN-118159910-A Additive-containing silicon-containing resist underlayer film forming composition 日产化学株式会社 2024-06-07 CN disclosed
CN-113518762-B Release layer dispersion of layered compound and transparent substrate using the same 公立大学法人大阪 2024-05-28 CN disclosed
US-20240162086-A1 SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE NISSAN CHEMICAL CORPORATION (JP) 2024-05-16 US disclosed
CN-114341232-B Process for producing silicon-containing polymer composition 日产化学株式会社 2024-05-07 CN disclosed
CN-117940850-A Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element 日产化学株式会社 2024-04-26 CN disclosed
US-11966164-B2 Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group NISSAN CHEMICAL CORPORATION (JP) 2024-04-23 US disclosed
US-11961636-B2 Silica-containing insulating composition NISSAN CHEMICAL CORPORATION (JP) 2024-04-16 US disclosed
EP-1366026-A2 PYRIMIDINE COMPOUNDS AND THEIR USE SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2003-12-03 EP disclosed
EP-1362852-A1 PYRAZOLE DERIVATIVE, INTERMEDIATE THEREFOR, PROCESSES FOR PRODUCING THESE, AND HERBICIDE CONTAINING THESE AS ACTIVE INGREDIENT SAGAMI CHEMICAL RESEARCH CENTER (JP) 2003-11-19 EP disclosed
WO-2002024663-A2 PYRIMIDINE COMPOUNDS AND THEIR USE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-03-28 WO disclosed
US-6174839-B1 AS HERBICIDE NIHON BAYER AGROCHEM K.K. (JP) 2001-01-16 US disclosed
US-5935907-A HERBICIDES NIHON BAYER AGROCHEM K.K. (JP) 1999-08-10 US disclosed
EP-0869123-A2 Phenylacetylene derivatives NIHON BAYER AGROCHEM K.K. (JP) 1998-10-07 EP disclosed
EP-0726266-B1 Indazole compounds and the use thereof as fungicides, insecticides and miticides MITSUBISHI CHEM CORP (JP) 1998-01-07 EP disclosed
US-5705453-A INSECTICIDES, MITICIDES, FUNGICIDES MITSUBISHI CHEMICAL CORPORATION (JP) 1998-01-06 US disclosed
CN-1137523-A Indazoles and use thereof MITSUBISHI CHEM CORP (JP) 1996-12-11 CN disclosed
EP-0726266-A1 Indazole compounds and the use thereof as fungicides, insecticides and miticides MITSUBISHI CHEMICAL CORPORATION (JP) 1996-08-14 EP disclosed