Carbon Monoxide

Carbon Monoxide

SCHEMBL609456

CCC1=C([W]N=O)CC=C1.[C]=O.[C]=O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29228945 0.96
SCHEMBL27755821 0.72
SCHEMBL27755815 0.71
SCHEMBL29228962 0.71
Formaldehyde SCHEMBL16715297 0.68
Carbon Monoxide SCHEMBL9394537 0.67
Carbon Monoxide SCHEMBL1349899 0.67
Carbon Monoxide SCHEMBL1132576 0.67
Carbon Monoxide SCHEMBL10608881 0.67
Iodide SCHEMBL27948583 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180166385-A1 INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME GLOBALFOUNDRIES U.S. INC. 2018-06-14 US disclosed
US-20180138123-A1 INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME GLOBALFOUNDRIES U.S. INC. 2018-05-17 US disclosed
US-9034760-B2 Methods of forming tensile tungsten films and compressive tungsten films NOVELLUS SYSTEMS, INC. (US) 2015-05-19 US disclosed
US-8614106-B2 Liner-free tungsten contact INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-12-24 US disclosed
US-8614107-B2 Liner-free tungsten contact INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-12-24 US disclosed
US-20130154098-A1 LINER-FREE TUNGSTEN CONTACT INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-06-20 US disclosed
US-20130127058-A1 LINER-FREE TUNGSTEN CONTACT INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-05-23 US disclosed
US-8367546-B2 Methods for forming all tungsten contacts and lines NOVELLUS SYSTEMS, INC. (US) 2013-02-05 US disclosed
US-20120040530-A1 METHODS FOR FORMING ALL TUNGSTEN CONTACTS AND LINES HUMAYUN RAASHINA (US) 2012-02-16 US disclosed
US-8062977-B1 Ternary tungsten-containing resistive thin films NOVELLUS SYSTEMS, INC. (US) 2011-11-22 US disclosed
US-8053365-B2 Methods for forming all tungsten contacts and lines NOVELLUS SYSTEMS, INC. (US) 2011-11-08 US disclosed
US-20090163025-A1 METHODS FOR FORMING ALL TUNGSTEN CONTACTS AND LINES NOVELLUS SYSTEMS, INC. (US) 2009-06-25 US disclosed