⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28377922 | 0.81 | TDP1 (0.30) | — | |
| SCHEMBL75200 | 0.79 | — | — | |
| SCHEMBL9610651 | 0.79 | — | — | |
| SCHEMBL6105003 | 0.77 | — | — | |
| SCHEMBL10796700 | 0.75 | — | — | |
| SCHEMBL1143468 | 0.75 | — | — | |
| SCHEMBL5265 | 0.73 | — | — | |
| SCHEMBL12236905 | 0.71 | — | — | |
| SCHEMBL621451 | 0.71 | — | — | |
| SCHEMBL1128372 | 0.71 | TDP1 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060058480-A1 | Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |