Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA3 | P07451 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CA6 | P23280 | 1/20 | 0.35 |
| ▸ | CA5A | P35218 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.31 |
| ▸ | MMP2 | P08253 | 1/20 | 0.31 |
| ▸ | MMP3 | P08254 | 1/20 | 0.31 |
| ▸ | MMP9 | P14780 | 1/20 | 0.31 |
| ▸ | MMP13 | P45452 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6128388 | 0.86 | RECQL (0.46) | RECQLCA1CA2 | |
| SCHEMBL1221451 | 0.86 | CYP19A1 (0.38) | RECQLMMP1MMP2MMP3MMP9 | |
| SCHEMBL11658270 | 0.86 | MAPT (0.38) | RECQLMAPT | |
| SCHEMBL5155385 | 0.85 | RECQL (0.44) | RECQLCA1CA2 | |
| Ammonia Solution, Strong SCHEMBL7099470 | 0.84 | RECQL (0.48) | RECQL | |
| SCHEMBL11515105 | 0.84 | MAPT (0.37) | RECQLMAPT | |
| SCHEMBL29958728 | 0.84 | CYP19A1 (0.37) | RECQLMMP1MMP2MMP3MMP9 | |
| SCHEMBL4385316 | 0.84 | CYP19A1 (0.37) | RECQLMMP1MMP2MMP3MMP9 | |
| SCHEMBL8408859 | 0.83 | RECQL (0.54) | RECQLMAPTCA1CA2EPHX2 | |
| SCHEMBL20773925 | 0.82 | RECQL (0.52) | RECQLMAPTCA1CA2EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10793766-B2 | Sulfosuccinate surfactant compositions and methods using the same | CYTEC INDUSTRIES INC. (US) | 2020-10-06 | — | — | US | claimed |
| WO-2018034695-A1 | SULFOSUCCINATE SURFACTANT COMPOSITIONS AND METHODS USING THE SAME | CYTEC INDUSTRIES INC. (US) | 2018-02-22 | — | — | WO | claimed |
| US-20180051201-A1 | SULFOSUCCINATE SURFACTANT COMPOSITIONS AND METHODS USING THE SAME | CYTEC INDUSTRIES INC. (US) | 2018-02-22 | — | — | US | claimed |
| US-10793766-B2 | Sulfosuccinate surfactant compositions and methods using the same | CYTEC INDUSTRIES INC. (US) | 2020-10-06 | — | — | US | disclosed |
| WO-2018034695-A1 | SULFOSUCCINATE SURFACTANT COMPOSITIONS AND METHODS USING THE SAME | CYTEC INDUSTRIES INC. (US) | 2018-02-22 | — | — | WO | disclosed |
| US-20180051201-A1 | SULFOSUCCINATE SURFACTANT COMPOSITIONS AND METHODS USING THE SAME | CYTEC INDUSTRIES INC. (US) | 2018-02-22 | — | — | US | disclosed |
| US-9760060-B2 | Photopolymer formulations for producing holographic media having highly crosslinked matrix polymers | COVESTRO DEUTSCHLAND AG (DE) | 2017-09-12 | — | — | US | disclosed |
| US-9760060-B2 | Photopolymer formulations for producing holographic media having highly crosslinked matrix polymers | COVESTRO DEUTSCHLAND AG (DE) | 2017-09-12 | — | — | US | disclosed |
| US-9146456-B2 | Photopolymer formulation for producing holographic media having highly crosslinked matrix polymers | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-9146456-B2 | Photopolymer formulation for producing holographic media having highly crosslinked matrix polymers | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-20130224634-A1 | PHOTOPOLYMER FORMULATION FOR PRODUCING HOLOGRAPHIC MEDIA HAVING HIGHLY CROSSLINKED MATRIX POLYMERS | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2013-08-29 | — | — | US | disclosed |
| US-20130224634-A1 | PHOTOPOLYMER FORMULATION FOR PRODUCING HOLOGRAPHIC MEDIA HAVING HIGHLY CROSSLINKED MATRIX POLYMERS | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2013-08-29 | — | — | US | disclosed |
| EP-2450893-A1 | Photopolymer formula for producing of holographic media with highly networked matrix polymers | Bayer MaterialScience AG (DE) | 2012-05-09 | — | — | EP | disclosed |
| WO-2007037497-A1 | OPTICAL COMPENSATORY FILM, POLARIZING PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2007-04-05 | — | — | WO | disclosed |