⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8711208 | 0.76 | — | — | |
| SCHEMBL8390929 | 0.73 | — | — | |
| SCHEMBL9949606 | 0.69 | — | — | |
| SCHEMBL570228 | 0.69 | — | — | |
| SCHEMBL59903 | 0.67 | — | — | |
| SCHEMBL9350682 | 0.67 | — | — | |
| SCHEMBL5909 | 0.67 | — | — | |
| SCHEMBL11843414 | 0.67 | — | — | |
| SCHEMBL25786 | 0.64 | — | — | |
| SCHEMBL10939811 | 0.64 | GABRR1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230259025-A1 | DRY DEPOSITED PHOTORESISTS WITH ORGANIC CO-REACTANTS | LAM RESEARCH CORPORATION | 2023-08-17 | — | — | US | disclosed |
| WO-2023114724-A1 | DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| US-11554572-B2 | Desiccant, organic thin film including same, organic layered film in which organic thin film is layered, and electronic device provided therewith | Konica Minolta, Inc. (JP) | 2023-01-17 | — | — | US | disclosed |
| US-11276837-B2 | Manufacturing method for electronic device | Konica Minolta, Inc. (JP) | 2022-03-15 | — | — | US | disclosed |
| WO-2022016123-A1 | DRY DEPOSITED PHOTORESISTS WITH ORGANIC CO-REACTANTS | LAM RESEARCH CORPORATION (US) | 2022-01-20 | — | — | WO | disclosed |
| EP-3453746-B1 | GEL-FORM COMPOSITION AND WATER ABSORPTION INHIBITOR | SHINETSU CHEMICAL CO (JP) | 2020-12-09 | — | — | EP | disclosed |
| US-20200335727-A1 | DESICCANT, ORGANIC THIN FILM INCLUDING SAME, ORGANIC LAYERED FILM IN WHICH ORGANIC THIN FILM IS LAYERED, AND ELECTRONIC DEVICE PROVIDED THEREWITH | Konica Minolta, Inc. (JP) | 2020-10-22 | — | — | US | disclosed |
| US-10808124-B2 | Gel-form composition and water absorption inhibitor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-20 | — | — | US | disclosed |
| US-20200266381-A1 | MANUFACTURING METHOD FOR ELECTRONIC DEVICE | Konica Minolta, Inc. (JP) | 2020-08-20 | — | — | US | disclosed |
| US-20190177540-A1 | GEL-FORM COMPOSITION AND WATER ABSORPTION INHIBITOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-13 | — | — | US | disclosed |
| US-6896980-B2 | Water-scavenging agent for an organic electroluminescent device and organic electroluminescent device comprising same | FUTABA CORPORATION (JP) | 2005-05-24 | — | — | US | disclosed |
| US-6887592-B2 | Organic EL element | FUTABA CORPORATION (JP) | 2005-05-03 | — | — | US | disclosed |
| US-20040256592-A1 | Organometallic complex compound can under drying process by ultraviolet-light irradiation or heating; dehydration to remove water while preparing electroluminescent device; forming a cured thermosetting resin film, a transparent film, free of water spot | FUTABA CORPORATION (JP) | 2004-12-23 | — | — | US | disclosed |
| US-6790381-B2 | TRIVALENT METALLIC ATOM COMPLEXES CONTAINIG ACETYLACETONATE AND ALCOHOLATE | FUTABA CORPORATION (JP) | 2004-09-14 | — | — | US | disclosed |
| US-20040056232-A1 | Water-scavenging agent for an organic electroluminescent device and organic electroluminescent device comprising same | FUTABA CORPORATION (JP) | 2004-03-25 | — | — | US | disclosed |
| US-6656609-B2 | Electroluminescence | FUTABA CORPORATION (JP) | 2003-12-02 | — | — | US | disclosed |
| US-20030170496-A1 | Organic EL element | FUTABA CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| US-20030110981-A1 | Trivalent metallic atom complexes containig acetylacetonate and alcoholate | FUTABA CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20020015818-A1 | Organic EL element | FUTABA DENSHI KOGYO KABUSHIKI KAISHA (JP) | 2002-02-07 | — | — | US | disclosed |
| US-5756650-A | COMPOSITION COMPRISING POLYAMIC ACID, CURE ACCELERATOR SELECTED FROM GROUP CONSISTING OF NITROGEN-CONTAINING HETEROCYCLIC COMPOUND, AMINO ACID COMPOUND, AROMATIC COMPOUND HAVING TWO OR MORE HYDROXYL GROUPS | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-26 | — | — | US | disclosed |