Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AR | P10275 | 2/20 | 0.62 |
| ▸ | HTT | P42858 | 2/20 | 0.58 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.58 |
| ▸ | MAPT | P10636 | 5/20 | 0.55 |
| ▸ | POLB | P06746 | 2/20 | 0.55 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.49 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | MITF | O75030 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | USP2 | O75604 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16233008 | 0.94 | AR (0.57) | ARHTTHIF1AMAPTPOLB | |
| SCHEMBL16233006 | 0.94 | AR (0.57) | ARHTTHIF1AMAPTPOLB | |
| SCHEMBL16233009 | 0.94 | AR (0.57) | ARHTTHIF1AMAPTPOLB | |
| SCHEMBL16233011 | 0.94 | AR (0.57) | ARHTTHIF1AMAPTPOLB | |
| SCHEMBL16233012 | 0.94 | AR (0.57) | ARHTTHIF1AMAPTPOLB | |
| SCHEMBL16227488 | 0.93 | AR (0.69) | ARHTTHIF1AMAPTPOLB | |
| SCHEMBL16227489 | 0.93 | AR (0.69) | ARHTTHIF1AMAPTPOLB | |
| SCHEMBL16232933 | 0.93 | AR (0.69) | ARHTTHIF1AMAPTPOLB | |
| SCHEMBL16232934 | 0.93 | AR (0.69) | ARHTTHIF1AMAPTPOLB | |
| SCHEMBL26073521 | 0.93 | AR (0.56) | ARHTTHIF1AMAPTPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11977333-B2 | Semiconductor devices and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-05-07 | — | — | US | disclosed |
| US-20240079235-A1 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-03-07 | — | — | US | disclosed |
| US-11842896-B2 | Semiconductor devices and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-12-12 | — | — | US | disclosed |
| US-20230251571-A1 | Photoresist and Method of Formation and Use | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2023-08-10 | — | — | US | disclosed |
| US-11650500-B2 | Photoresist and method of formation and use | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-05-16 | — | — | US | disclosed |
| US-20230146910-A1 | METHODS AND COMPOSITIONS FOR IMPROVED PATTERNING OF PHOTORESIST | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-05-11 | — | — | US | disclosed |
| US-20230064162-A1 | Semiconductor Device and Methods of Manufacture | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-03-02 | — | — | US | disclosed |
| US-20220392764-A1 | UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-12-08 | — | — | US | disclosed |
| US-20220367177-A1 | Semiconductor Devices and Methods of Manufacturing | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2022-11-17 | — | — | US | disclosed |
| US-11145560-B2 | Semiconductor device and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2021-10-12 | — | — | US | disclosed |
| US-9017934-B2 | Photoresist defect reduction system and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-04-28 | — | — | US | disclosed |
| US-20150111384-A1 | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 2015-04-23 | — | — | US | disclosed |
| US-20150056555-A1 | Photoresist and Method of Formation and Use | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-02-26 | — | — | US | disclosed |
| US-20140272724-A1 | Photoresist System and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140272716-A1 | Photoresist System and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140273457-A1 | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140273506-A1 | Unlocking Layer and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-20140255851-A1 | Photoresist Defect Reduction System and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-11 | — | — | US | disclosed |
| US-6881529-B2 | Positive photoresist transfer material and method for processing surface of substrate using the transfer material | FUJI PHOTO FILM CO., LTD. (JP) | 2005-04-19 | — | — | US | disclosed |
| US-20030087179-A1 | Positive photoresist transfer material and method for processing surface of substrate using the transfer material | FUJI PHOTO FILM CO., LTD. | 2003-05-08 | — | — | US | disclosed |