SCHEMBL6131247

SCHEMBL6131247

C=C(C)C(=O)OC(C)C.C=CC(=O)OCCCC

nearest known ligand 0.65

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 10/20 0.65
HPGD P15428 1/20 0.65
ALDH1A1 P00352 4/20 0.47
CYP3A4 P08684 1/20 0.47
ATM Q13315 1/20 0.46
HCAR2 Q8TDS4 3/20 0.41
MAPT P10636 1/20 0.40
RAB9A P51151 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
TP53 P04637 2/20 0.40
HIF1A Q16665 2/20 0.40
HSD17B10 Q99714 1/20 0.40
THRB P10828 2/20 0.38
LMNA P02545 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27631066 0.90 TSHR (0.63) TSHRHPGDALDH1A1CYP3A4ATM
Methacrylic Acid SCHEMBL28276074 0.89 TSHR (0.51) TSHRHPGDALDH1A1CYP3A4ATM
Acrylic Acid SCHEMBL28304706 0.89 TSHR (0.56) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL11391417 0.88 TSHR (0.57) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL10886315 0.86 TSHR (0.51) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL5202522 0.86 TSHR (0.58) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL3148888 0.86 TSHR (0.76) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL9488348 0.86 TSHR (0.66) TSHRHPGDALDH1A1ATMHCAR2
SCHEMBL313059 0.86 TSHR (0.76) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL11810623 0.86 TSHR (0.88) TSHRHPGDALDH1A1CYP3A4ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112689501-B Make-up preparation 陶氏环球技术有限责任公司 2023-05-16 CN disclosed
US-20050032008-A1 Silver halide color photosensitive material FUJI PHOTO FILM CO., LTD. 2005-02-10 US disclosed
US-6844146-B2 Silver halide color photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 2005-01-18 US disclosed