⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5881281 | 1.00 | — | — | |
| SCHEMBL9802594 | 0.97 | — | — | |
| SCHEMBL9728413 | 0.96 | — | — | |
| SCHEMBL9728343 | 0.89 | — | — | |
| SCHEMBL9802735 | 0.80 | — | — | |
| SCHEMBL6792788 | 0.78 | — | — | |
| SCHEMBL6793240 | 0.76 | MEN1 (0.39) | — | |
| SCHEMBL13932484 | 0.76 | — | — | |
| SCHEMBL9299016 | 0.74 | — | — | |
| SCHEMBL420038 | 0.73 | MEN1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1298156-B1 | FLUORINATED CYCLOOLEFIN POLYMERS, PROCESSES FOR THEIR PREPARATION AND THEIR USE | MITSUI CHEMICALS INC (JP) | 2005-08-17 | — | — | EP | disclosed |
| US-6875819-B2 | Fluorinated cycloolefin polymers, processes for preparation of fluorinated cycloofefin monomers and polymers thereof, and use of the same | MITSUI CHEMICALS, INC. (JP) | 2005-04-05 | — | — | US | disclosed |
| US-20030187168-A1 | Fluorinated cycloolefin polymers, processes for preparation of fluorinated cycloofefin monomers and polymers thereof, and use of the same | MITSUI CHEMICALS, INC. (JP) | 2003-10-02 | — | — | US | disclosed |
| EP-1298156-A1 | FLUORINATED CYCLOOLEFIN POLYMERS, PROCESSES FOR PREPARATION OF FLUORINATED CYCLOOLEFIN MONOMERS AND POLYMERS THEREOF, AND USE OF THE SAME | Mitsui Chemicals, Inc. (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-6511787-B2 | Acrylic resin containing hexafluoroisopropanol units having high transmittance to ultraviolet radiation having high transparency, substrate adhesion, alkali development, and acid-elimination capability for lithographic microprocessing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-28 | — | — | US | disclosed |
| US-20020048724-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-25 | — | — | US | disclosed |