Dimethylamine

Dimethylamine

SCHEMBL6136001

CNC.NN.[B]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Dimethylamine SCHEMBL28024672 0.93
Dimethylamine SCHEMBL6135995 0.86
Dimethylamine SCHEMBL2273529 0.84
Dimethylamine SCHEMBL134527 0.77
Dimethylamine SCHEMBL5164633 0.76
Dimethylamine SCHEMBL12415750 0.76
Dimethylamine SCHEMBL1330452 0.76
Dimethylamine SCHEMBL1030 0.76
Dimethylamine SCHEMBL392668 0.76
Dimethylamine SCHEMBL13695986 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1052653-B1 Conductive powder and making process SHINETSU CHEMICAL CO (JP) 2005-07-13 EP disclosed
US-6680081-B2 OVERCOATING PARTICLE WITH ORGANOSILICON POLYMER AND METAL; HEAT RESISTANCE, CONDUCTIVITY STABILITY SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-01-20 US disclosed
US-6485831-B1 Conductive powder and making process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-11-26 US disclosed
US-20020142094-A1 Conductive powder and making process SHIN-ETSU CHEMICAL CO., LTD. 2002-10-03 US disclosed
EP-1052653-A2 Conductive powder and making process Shin-Etsu Chemical Co., Ltd. (JP) 2000-11-15 EP disclosed