SCHEMBL6142271

SCHEMBL6142271

[Se]=C(CC1CS1)CC1CC[Se]CC1CC(=[Se])CC1CS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1024994 0.79
SCHEMBL1025040 0.73
SCHEMBL6141891 0.70
SCHEMBL6142366 0.68
SCHEMBL1023929 0.64
SCHEMBL6141890 0.64
SCHEMBL1023689 0.64
SCHEMBL6141932 0.64
SCHEMBL1025008 0.61
SCHEMBL1025237 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1120667-B1 Process for production of optical material MITSUBISHI GAS CHEMICAL CO (JP) 2005-06-22 EP disclosed
EP-1099721-B1 Composition for producing resin MITSUBISHI GAS CHEMICAL CO (JP) 2005-01-12 EP disclosed
EP-1120667-A2 Process for production of optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-08-01 EP disclosed
EP-1099721-A1 Composition for producing resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-16 EP disclosed