SCHEMBL614996

SCHEMBL614996

CC(O)N(C(=O)O)C(C)O

nearest known ligand 0.44

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.44
SLC22A6 Q4U2R8 1/20 0.33
ALOX5 P09917 1/20 0.32
TSHR P16473 1/20 0.32
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA9 Q16790 1/20 0.31
SLC7A5 Q01650 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL42467 0.76 TP53 (0.39) TP53ALDH1A1SLC7A5
SCHEMBL193411 0.76 TP53 (0.39) TP53ALOX5ALDH1A1LMNACA12
SCHEMBL672963 0.73 TP53 (0.37) TP53SLC7A5
SCHEMBL11412852 0.73 TP53 (0.37) TP53SLC7A5
SCHEMBL8386961 0.73 TP53 (0.37) TP53SLC7A5
SCHEMBL624169 0.73 TP53 (0.37) TP53ALOX5TSHRALDH1A1LMNA
SCHEMBL638833 0.73 TP53 (0.37) TP53SLC7A5
SCHEMBL5932574 0.73 TP53 (0.37) TP53ALOX5ALDH1A1LMNACA12
SCHEMBL673528 0.73 TP53 (0.37) TP53SLC7A5
SCHEMBL150601 0.73 TP53 (0.37) TP53SLC7A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112011050-B Ultrahigh-performance water reducing agent and preparation method thereof 中国建材检验认证集团北京天誉有限公司 2022-05-27 CN claimed
CN-111995327-B Ultrahigh-performance concrete and preparation method thereof 中国建材检验认证集团北京天誉有限公司 2022-02-11 CN claimed
CN-112011050-A Ultrahigh-performance water reducing agent and preparation method thereof 中国建材检验认证集团北京天誉有限公司 2020-12-01 CN claimed
EP-0088377-B1 CARBAMATE AND CARBONATE SALTS OF TERTIARY AMINES AIR PRODUCTS AND CHEMICALS, INC. (US) 1987-04-22 EP claimed
EP-3586383-B1 POLYMER PHOTOVOLTAIC CELL WITH AN INVERTED STRUCTURE AND PROCESS FOR ITS PREPARATION ENI SPA (IT) 2024-02-14 EP disclosed
US-20230309371-A1 INVERTED POLYMER PHOTOVOLTAIC CELL AND METHOD FOR PREPARATION THEREOF ENI S.P.A. (IT) 2023-09-28 US disclosed
EP-4197039-A1 INVERTED POLYMER PHOTOVOLTAIC CELL AND METHOD FOR PREPARATION THEREOF ENI S.p.A. (IT) 2023-06-21 EP disclosed
US-20220416169-A1 POLYMERIC PHOTOVOLTAIC CELL WITH INVERTED STRUCTURE COMPRISING A CONJUGATED POLYMER COMPRISING AN ANTHRADITHIOPHENE DERIVATIVE ENI S.P.A. (IT) 2022-12-29 US disclosed
US-11374186-B2 Polymer photovoltaic cell with an inverted structure and process for its preparation ENI S.P.A. (IT) 2022-06-28 US disclosed
CN-112011050-B Ultrahigh-performance water reducing agent and preparation method thereof 中国建材检验认证集团北京天誉有限公司 2022-05-27 CN disclosed
EP-3997744-A1 PROCESS FOR PRODUCING INVERTED POLYMER PHOTOVOLTAIC CELLS ENI S.p.A. (IT) 2022-05-18 EP disclosed
WO-2022034451-A1 INVERTED POLYMER PHOTOVOLTAIC CELL AND METHOD FOR PREPARATION THEREOF ENI S.P.A. (IT) 2022-02-17 WO disclosed
US-20120040875-A1 Water-Based Hydraulic Fluids Comprising Dithio-Di(Aryl Carbolic Acids) CLARIANT FINANCE (BVI) LIMITED (VG) 2012-02-16 US disclosed
EP-1702372-B1 POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE SHOWA DENKO KK (JP) 2010-09-01 EP disclosed
US-20070173575-A1 Polymer for anode buffer layer, coating solution for anode buffer layer, and organic light emitting device SHOWA DENKO K.K. (JP) 2007-07-26 US disclosed
EP-1702372-A1 POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE Showa Denko K.K. (JP) 2006-09-20 EP disclosed
WO-2005057677-A1 POLYMER FOR ANODE BUFFER LAYER, COATING SOLUTION FOR ANODE BUFFER LAYER, AND ORGANIC LIGHT EMITTING DEVICE SHOWA DENKO K.K (JP) 2005-06-23 WO disclosed
EP-1159133-A1 POSITIVE-WORKING PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND METHOD FOR PRODUCING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2001-12-05 EP disclosed
WO-2000029214-A1 POSITIVE-WORKING PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND METHOD FOR PRODUCING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2000-05-25 WO disclosed
US-4588783-A FROM AMIDOAMINE AND CYCLIC ORGANIC CARBONATE: COATINGS PPG INDUSTRIES, INC. (US) 1986-05-13 US disclosed