SCHEMBL617694

SCHEMBL617694

CCC1(CCO)COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3187825 0.93 EPHX1 (0.44)
SCHEMBL3200589 0.86 EPHX1 (0.41)
SCHEMBL3414474 0.84 EPHX1 (0.39)
SCHEMBL2593634 0.84 EPHX1 (0.46)
SCHEMBL29370245 0.84 EPHX1 (0.39)
SCHEMBL3205530 0.83 EPHX1 (0.42)
SCHEMBL3417847 0.82 EPHX1 (0.38)
SCHEMBL3421670 0.82 EPHX1 (0.38)
SCHEMBL3422314 0.82 EPHX1 (0.38)
SCHEMBL1352530 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 484 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117510701-A Water-absorbent resin particle, preparation method thereof and absorber 中国天辰工程有限公司 2024-02-06 CN claimed
EP-4737507-A1 METHOD FOR PRODUCING WATER-ABSORBING RESIN PARTICLES, WATER-ABSORBING RESIN PARTICLES, ABSORBER, AND ABSORBENT ARTICLE Sumitomo Seika Chemicals Co., Ltd. (JP) 2026-05-06 EP disclosed
EP-4732816-A1 DEODORANT COMPOSITION Sumitomo Seika Chemicals Co., Ltd. (JP) 2026-04-29 EP disclosed
EP-4435064-B1 NONAQUEOUS INKJET INK AND METHOD FOR FORMING CURED PRODUCT KONICA MINOLTA INC (JP) 2026-04-22 EP disclosed
US-12583999-B2 Water-absorbing resin particles, absorbing body, and absorbent article SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2026-03-24 US disclosed
EP-4711426-A1 ACTIVE RAY-CURABLE INKJET INK COMPOSITION, METHOD FOR FORMING INSULATING FILM, INSULATING FILM, AND PRINTED WIRING BOARD KONICA MINOLTA, INC. (JP) 2026-03-18 EP disclosed
US-20260061393-A1 METHOD FOR PRODUCING WATER-ABSORBENT RESIN PARTICLES SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2026-03-05 US disclosed
EP-4696719-A1 METHOD FOR PRODUCING WATER-ABSORBING RESIN PARTICLES, WATER-ABSORBING RESIN PARTICLES, ABSORBER, AND ABSORBENT ARTICLE Sumitomo Seika Chemicals Co., Ltd. (JP) 2026-02-18 EP disclosed
EP-4691627-A1 PARTICULATE WATER ABSORBENT, ABSORBER CONTAINING SAID PARTICULATE WATER ABSORBENT, AND SANITARY PRODUCT CONTAINING SAID ABSORBER Nippon Shokubai Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20260021472-A1 PARTICULATE WATER-ABSORBING AGENT, ABSORBENT BODY CONTAINING THE PARTICULATE WATER-ABSORBING AGENT, AND SANITARY PRODUCT INCLUDING THE ABSORBENT BODY NIPPON CATALYTIC CHEM IND (JP) 2026-01-22 US disclosed
US-20040036753-A1 Ink-jet image forming method KONICA CORPORATION (JP) 2004-02-26 US disclosed
US-20030202079-A1 Inkjet image forming method and inkjet image forming system KONICA CORPORATION (JP) 2003-10-30 US disclosed
EP-0867443-B1 Hydrolyzable and polymerizable oxetanesilanes IVOCLAR VIVADENT AG (LI) 2003-08-06 EP disclosed
US-6284898-B1 DENTAL MATERIAL IVOCLAR AG (LI) 2001-09-04 US disclosed
US-6096903-A Hydrolysable and polymerizable oxetane silanes IVOCLAR AG (LI) 2000-08-01 US disclosed
EP-0867443-A2 Hydrolyzable and polymerizable oxetanesilanes IVOCLAR AG (LI) 1998-09-30 EP disclosed
US-4871484-A Process for the preparation of 2,2-bis-chloro-methylalkanecarboxylic acid chlorides BAYER AKTIENGESELLSCHAFT (DE) 1989-10-03 US disclosed
US-4415692-A BLENDS OF POLYCARBONATE, ACRYLONITRILE-BUTADIENE-STYRENE COPOLYMER AND AN ORGANIC BORATE; HEAT RESISTANCE BAYER AKTIENGESELLSCHAFT (DE) 1983-11-15 US disclosed
US-4225483-A Boric acid esters and oxetanes for stabilizing phosphite-free polycarbonates BAYER AKTIENGESELLSCHAFT (DE) 1980-09-30 US disclosed
EP-0001823-A2 Use of esters of boric acid to stabilize phosphite-free polycarbonates, and the obtained stabilized polycarbonate moulding compositions BAYER AG (DE) 1979-05-16 EP disclosed