⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8759279 | 0.74 | — | — | |
| SCHEMBL7879096 | 0.74 | — | — | |
| SCHEMBL9019453 | 0.73 | — | — | |
| SCHEMBL8147198 | 0.70 | — | — | |
| SCHEMBL29085686 | 0.69 | — | — | |
| Chloromethane SCHEMBL8148867 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL7104320 | 0.68 | — | — | |
| SCHEMBL29216521 | 0.67 | — | — | |
| SCHEMBL9157580 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL29255427 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1520862-A2 | Butadiene polymer, and process for producing conjugated diene polymer | JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2005-04-06 | — | — | EP | disclosed |
| EP-1054026-B1 | BUTADIENE POLYMERS AND PROCESS FOR PRODUCING CONJUGATED DIENE POLYMERS | JP AGENCY OF INDUSTRIALSCIENCE (JP) | 2004-12-08 | — | — | EP | disclosed |
| US-6653430-B1 | Addition polymerizing in presence of Group 4 metal complex having cyclopentadienyl structure and alumoxane cocatalyst; high cis configuration | JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2003-11-25 | — | — | US | disclosed |
| EP-1054026-A1 | BUTADIENE POLYMERS AND PROCESS FOR PRODUCING CONJUGATED DIENE POLYMERS | JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2000-11-22 | — | — | EP | disclosed |