⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL19715267 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL28243721 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL28242869 | 0.87 | — | — | |
| Ammonia Solution, Strong SCHEMBL7806651 | 0.87 | — | — | |
| Ammonia Solution, Strong SCHEMBL9470805 | 0.87 | — | — | |
| Ammonia Solution, Strong SCHEMBL9560152 | 0.82 | — | — | |
| Ammonia Solution, Strong SCHEMBL5535903 | 0.82 | — | — | |
| Ammonia Solution, Strong SCHEMBL598196 | 0.82 | — | — | |
| Ammonia Solution, Strong SCHEMBL3683848 | 0.82 | — | — | |
| Ammonia Solution, Strong SCHEMBL561792 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-59134608-A | — | — | None | — | — | JP | disclosed |
| JP-61033804-A | — | — | None | — | — | JP | disclosed |
| CN-101583425-A | Transition metal-containing catalysts and catalyst combinations including transition metal-containing catalysts and processes for their preparation and use as oxidation catalysts | MONSANTO TECHNOLOGY LLC (US) | 2009-11-18 | — | — | CN | disclosed |
| CN-101427406-A | Transition metal-containing catalysts and processes for their preparation and use as fuel cell catalysts | MONSANTO TECHNOLOGY LLC (US) | 2009-05-06 | — | — | CN | disclosed |
| CN-1285102-C | Metal silicide double-layer structure and forming method thereof | TAIWAN SEMICONDUCTOR MFG (CN) | 2006-11-15 | — | — | CN | disclosed |
| US-20050076580-A1 | Polishing composition and use thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-04-14 | — | — | US | disclosed |
| EP-1522565-A2 | Polishing composition and use thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-04-13 | — | — | EP | disclosed |
| CN-1567536-A | Metal silicide double-layer structure and forming method thereof | TAIWAN SEMICONDUCTOR MFG (CN) | 2005-01-19 | — | — | CN | disclosed |
| JP-S6133804-A | DIAMOND TOOL MATERIAL AND METHOD OF MANUFACTURE THEREOF | KURATOMI TATSURO | 1986-02-17 | — | — | JP | disclosed |
| JP-S59134608-A | DRILL OF HARD SINTERED ALLOY AND MANUFACTURING METHOD THEREOF | KURATOMI TATSURO | 1984-08-02 | — | — | JP | disclosed |