SCHEMBL6234004

SCHEMBL6234004

Cc1ccc(C(=O)O)c(C(=O)O)c1.[NaH]

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CSNK2A1 P68400 1/20 0.65
SORT1 Q99523 1/20 0.50
ALDH1A1 P00352 4/20 0.48
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
NOTUM Q6P988 1/20 0.48
POLB P06746 1/20 0.48
AKR1C3 P42330 1/20 0.48
GFER P55789 1/20 0.47
MCL1 Q07820 1/20 0.47
KDM4E B2RXH2 1/20 0.47
CLCN2 P51788 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
PPARG P37231 1/20 0.46
PPARA Q07869 1/20 0.46
METAP2 P50579 1/20 0.46
ALOX15 P16050 1/20 0.46
CYP1A2 P05177 1/20 0.46
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31627797 0.98 CSNK2A1 (0.68) CSNK2A1SORT1ALDH1A1MEN1KMT2A
SCHEMBL467550 0.98 CSNK2A1 (0.68) CSNK2A1SORT1ALDH1A1MEN1KMT2A
Hydrochloric Acid SCHEMBL6633682 0.95 CSNK2A1 (0.65) CSNK2A1SORT1ALDH1A1MEN1KMT2A
Hydrochloric Acid SCHEMBL302205 0.95 CSNK2A1 (0.65) CSNK2A1SORT1ALDH1A1MEN1KMT2A
Methyl Alcohol SCHEMBL28948582 0.95 CSNK2A1 (0.65) CSNK2A1SORT1ALDH1A1MEN1KMT2A
SCHEMBL4253511 0.95 CSNK2A1 (0.65) CSNK2A1SORT1ALDH1A1MEN1KMT2A
Mellitic Acid SCHEMBL15527813 0.91 CSNK2A1 (0.61) CSNK2A1SORT1ALDH1A1MEN1KMT2A
Alcohol SCHEMBL28948565 0.89 CSNK2A1 (0.59) CSNK2A1SORT1ALDH1A1MEN1KMT2A
Naphthalene SCHEMBL9009327 0.87 CSNK2A1 (0.57) CSNK2A1SORT1ALDH1A1MEN1KMT2A
Boric Acid SCHEMBL27962488 0.87 CSNK2A1 (0.57) CSNK2A1SORT1ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116803970-A 6,6' -disubstituted-3, 3', 4' -biphenyl tetracarboxylic acid and dianhydride thereof and preparation method thereof 中国石油化工股份有限公司 2023-09-26 CN disclosed
CN-116789543-A Preparation method of 4-halogenated-5-substituted phthalic acid and product and application thereof 中国石油化工股份有限公司 2023-09-22 CN disclosed
EP-0803764-B2 Method for preparing a photothermographic material FUJI PHOTO FILM CO LTD (JP) 2005-03-30 EP disclosed
CN-1125374-C Photothermographic material and method for making FUJI PHOTO FILM CO LTD (JP) 2003-10-22 CN disclosed
US-6528244-B1 Fog suppression FUJI PHOTO FILM CO., LTD. (JP) 2003-03-04 US disclosed
US-6468720-B1 TRANSPORT SPEED OF 22 TO 40 MM/SEC. AT LEAST 117 DEGREES C IN NOT LESS THAN 10 SEC, CONTACTING HEATER AT 90 TO 115 C; HIGH CONTRAST WITHOUT FOGGING, REDUCED VARIATION OF PERFORMANCE, DIMENSIONAL CHANGE, DENSITY FLUCTUATION KONICA CORPORATION (JP) 2002-10-22 US disclosed
EP-0803764-B1 Method for preparing a photothermographic material FUJI PHOTO FILM CO LTD (JP) 2001-06-27 EP disclosed
EP-1094361-A1 Processing method of photothermographic material KONICA CORPORATION (JP) 2001-04-25 EP disclosed
US-6165707-A Photothermographic or thermographic image-forming material FUJI PHOTO FILM CO., LTD. (JP) 2000-12-26 US disclosed
US-6140037-A SUPPORT WITH PHOTOTHERMOGRAPHIC MATERIAL, SILVER HALIDE AND SILVER SALT WITH REDUCING AGENT IN DISPERSION OF THERMOPLASTIC RESIN AND COATING, DRYING FUJI PHOTO FILM CO., LTD. (JP) 2000-10-31 US disclosed
CN-1168482-A Photothermographic material and method for making FUJI PHOTO FILM CO LTD (JP) 1997-12-24 CN disclosed
EP-0803764-A1 Photothermographic material and method for making FUJI PHOTO FILM CO., LTD. (JP) 1997-10-29 EP disclosed
US-4097431-A TEREPHTHALIC ACID, ISOPHTHALIC ACID, BISPHENOL, PHOSPHITE COMPOUND, FIREPROOFING, DISCOLORATION INHIBITION UNITIKA LTD. (JA) 1978-06-27 US disclosed