Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4879181 | 0.90 | — | — | |
| SCHEMBL29382976 | 0.90 | TSHR (0.39) | TSHRTDP1 | |
| SCHEMBL863801 | 0.90 | TSHR (0.39) | TSHRTDP1 | |
| SCHEMBL29484204 | 0.90 | TSHR (0.39) | TSHRTDP1 | |
| Lithium Ion SCHEMBL4301067 | 0.90 | — | — | |
| Potassium Ion SCHEMBL967327 | 0.90 | — | — | |
| SCHEMBL15715909 | 0.90 | TSHR (0.39) | TSHRTDP1 | |
| SCHEMBL17422887 | 0.82 | TSHR (0.33) | TSHRTDP1 | |
| SCHEMBL6302277 | 0.82 | TSHR (0.33) | TSHRTDP1 | |
| SCHEMBL8214546 | 0.73 | TSHR (0.35) | TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117263969-A | Dimethyl isopropoxy aluminum and preparation method thereof | 江苏南大光电材料股份有限公司 | 2023-12-22 | — | — | CN | claimed |
| CN-113463067-A | Selective deposition of silicon oxide on metal surfaces | ASM IP私人控股有限公司 | 2021-10-01 | — | — | CN | claimed |
| CN-111816547-A | Selective deposition of metal oxides on metal surfaces | ASM IP 控股有限公司 | 2020-10-23 | — | — | CN | claimed |
| CN-117263969-A | Dimethyl isopropoxy aluminum and preparation method thereof | 江苏南大光电材料股份有限公司 | 2023-12-22 | — | — | CN | disclosed |
| CN-116103633-A | Selective deposition of materials comprising silicon and oxygen using plasma | ASM IP私人控股有限公司 | 2023-05-12 | — | — | CN | disclosed |
| CN-116065134-A | Selective thermal deposition method | ASM IP私人控股有限公司 | 2023-05-05 | — | — | CN | disclosed |
| CN-114975440-A | Nanosheet field effect transistor device and method of forming the same | 台湾积体电路制造股份有限公司 | 2022-08-30 | — | — | CN | disclosed |
| CN-114262878-A | Silicon oxide deposition method | ASM IP私人控股有限公司 | 2022-04-01 | — | — | CN | disclosed |
| CN-113463067-A | Selective deposition of silicon oxide on metal surfaces | ASM IP私人控股有限公司 | 2021-10-01 | — | — | CN | disclosed |
| CN-111816547-A | Selective deposition of metal oxides on metal surfaces | ASM IP 控股有限公司 | 2020-10-23 | — | — | CN | disclosed |
| US-20050271817-A1 | Method for preparation of aluminum oxide thin film | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2005-12-08 | — | — | US | disclosed |
| CN-1675404-A | Preparation method of aluminum oxide film | KOREA RES INST CHEM TECH (KR) | 2005-09-28 | — | — | CN | disclosed |
| EP-1540033-A1 | METHOD FOR PREPARATION OF ALUMINUM OXIDE THIN FILM | Korea Research Institute of Chemical Technology (KR) | 2005-06-15 | — | — | EP | disclosed |
| WO-2004013377-A1 | METHOD FOR PREPARATION OF ALUMINUM OXIDE THIN FILM | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2004-02-12 | — | — | WO | disclosed |