SCHEMBL62492

SCHEMBL62492

CC[n+]1ccc(C)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL1502745 0.97 HTT (0.54) —
Water SCHEMBL2149413 0.97 HTT (0.54) —
Fluoride Ion SCHEMBL1502900 0.97 HTT (0.54) —
Iodide SCHEMBL1502806 0.97 HTT (0.54) —
Hydrochloric Acid SCHEMBL1502838 0.97 HTT (0.54) —
SCHEMBL30329823 0.92 HTT (0.50) —
SCHEMBL2150124 0.90 HTT (0.48) —
Perchlorate SCHEMBL2150468 0.86 HTT (0.45) —
SCHEMBL16699884 0.86 HTT (0.45) —
Sulfuric Acid SCHEMBL21195058 0.84 HTT (0.44) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 278 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250196021-A1 METHODS OF SOLVENT DISPLACEMENT FOR METAL-CONTAINING IONIC LIQUIDS CHEVRON PHILLIPS CHEMICAL COMPANY LP 2025-06-19 — — US claimed
WO-2025128828-A1 METHODS OF SOLVENT DISPLACEMENT FOR METAL-CONTAINING IONIC LIQUIDS CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2025-06-19 — — WO claimed
EP-3204977-B1 ELECTROLYTE FOR RECHARGEABLE ELECTROCHEMICAL CELL EOS ENERGY TECH HOLDINGS LLC (US) 2023-12-20 — — EP claimed
EP-3244987-B1 SEPARATIONS WITH IONIC LIQUID SOLVENTS CHEVRON PHILLIPS CHEMICAL CO LP (US) 2022-06-22 — — EP claimed
CN-114195767-A Quinone oxidoreductase-based tea extract EGCG prodrug and preparation method and application thereof 江苏下蜀黄土农业科技有限公司 2022-03-18 — — CN claimed
CN-107427758-B Separation using ionic liquid solvents 切弗朗菲利浦化学公司 2020-11-20 — — CN claimed
US-10227274-B2 Separations with ionic liquid solvents CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2019-03-12 — — US claimed
CN-107427758-A Utilize the separation of ion liquid solvent 切弗朗菲利浦化学公司 2017-12-01 — — CN claimed
EP-3244987-A1 SEPARATIONS WITH IONIC LIQUID SOLVENTS Chevron Phillips Chemical Company LP (US) 2017-11-22 — — EP claimed
US-20150133711-A1 Separations With Ionic Liquid Solvents CHEVRON PHILLIPS CHEMICAL COMPANY LP 2015-05-14 — — US claimed
EP-1658268-B1 MIXTURES OF IONIC LIQUIDS WITH LEWIS ACIDS NOVARTIS AG (CH) 2014-02-12 — — EP claimed
EP-2276917-B1 DEVICE, SYSTEM AND METHOD FOR PROVIDING A REDUCING AGENT FOR A SYSTEM FOR THE SELECTIVE CATALYTIC REDUCTION OF NITROGEN OXIDES BOSCH GMBH ROBERT (DE) 2012-03-14 — — EP claimed
EP-2276917-A2 DEVICE, SYSTEM AND METHOD FOR PROVIDING A REDUCING AGENT FOR A SYSTEM FOR THE SELECTIVE CATALYTIC REDUCTION OF NITROGEN OXIDES Robert Bosch GmbH (DE) 2011-01-26 — — EP claimed
WO-2009138296-A2 DEVICE, SYSTEM AND METHOD FOR PROVIDING A REDUCING AGENT FOR A SYSTEM FOR THE SELECTIVE CATALYTIC REDUCTION OF NITROGEN OXIDES ROBERT BOSCH GMBH (DE) 2009-11-19 — — WO claimed
US-4287335-A WHEREIN SAID COMPOUND IS A STYRYLPYRIDINIUM SALT OR A STYRYLQUINOLINIUM SALT USEFUL IN PRODUCING A PHOTOSENSITIVE RESIN AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) 1981-09-01 — — US claimed
EP-4737529-A1 ADHESIVE COMPOSITION, ADHESIVE TAPE AND THE USE THEREOF, AND METHOD FOR ELECTRICALLY MODIFYING THE ADHESIVE STRENGTH OF THE ADHESIVE TAPE TESA SE (DE) 2026-05-06 — — EP disclosed
US-20260118757-A1 RADIATION-SENSITIVE RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-04-30 — — US disclosed
WO-2005061422-A1 PROCESS FOR THE SEPARATION OF OLEFINS AND PARAFFINS SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ B.V. (NL) 2005-07-07 — — WO disclosed
US-4444868-A CONTAINING STYRYL-TYPE NITROGEN-HETEROCYCLE RESIDUE POLYMER AND ACID AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) 1984-04-24 — — US disclosed
US-4287335-A WHEREIN SAID COMPOUND IS A STYRYLPYRIDINIUM SALT OR A STYRYLQUINOLINIUM SALT USEFUL IN PRODUCING A PHOTOSENSITIVE RESIN AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) 1981-09-01 — — US disclosed
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