Ethylene

Ethylene

SCHEMBL6264686

C=C.C=CCOP(=O)(O)O

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 8/20 0.48
LPAR2 Q9HBW0 6/20 0.48
FNTA P49354 3/20 0.40
FNTB P49356 3/20 0.40
MPI P34949 1/20 0.35
TPI1 P60174 2/20 0.34
BTN3A1 O00481 2/20 0.34
LPAR1 Q92633 4/20 0.33
PGK1 P00558 1/20 0.33
PGK2 P07205 1/20 0.33
FBP1 P09467 1/20 0.32
FDPS P14324 1/20 0.32
BLM P54132 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15847030 0.97 LPAR3 (0.50) LPAR3LPAR2FNTAFNTBMPI
SCHEMBL30321 0.97
SCHEMBL11598005 0.95
SCHEMBL10396225 0.95
Hydrochloric Acid SCHEMBL3262835 0.95
SCHEMBL787423 0.95
Water SCHEMBL2238973 0.95
SCHEMBL3364236 0.95
Charcoal, Activated SCHEMBL4957360 0.95
Methane SCHEMBL4957355 0.95 LPAR3 (0.48) LPAR3LPAR2FNTAFNTBMPI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117050709-A Environment-friendly degradable polyurethane adhesive and preparation method thereof 深圳市阿尔拓科技有限公司 2023-11-14 CN disclosed
CN-114989219-A Cyclic phosphate compound and preparation method and application thereof 如鲲(江苏)新材料科技有限公司 2022-09-02 CN disclosed
US-20220169872-A1 AQUEOUS DISPERSION, METHOD OF MANUFACTURING AQUEOUS DISPERSION, AND INK RICOH COMPANY, LTD. (JP) 2022-06-02 US disclosed
CN-111808137-A Preparation method of vinyl hydrocarbon phosphate, vinyl hydrocarbon phosphate and application 江苏华盛锂电材料股份有限公司 2020-10-23 CN disclosed
WO-2020066163-A1 PARTICLE-CONTAINING COMPOSITION, COMPOSITION FOR SPRAY, AND GEL-LIKE COMPOSITION 第一工業製薬株式会社 2020-04-02 WO disclosed
CN-1916032-B Production method of water-absorbent resin, water-absorbent resin, and usage of water-absorbent resin NIPPON CATALYTIC CHEM IND 2011-06-15 CN disclosed
CN-1916032-A Production method of water-absorbent resin, water-absorbent resin, and usage of water-absorbent resin NIPPON CATALYTIC CHEM IND (JP) 2007-02-21 CN disclosed
US-6951386-B2 Adsorbent for ink jet use, an ink retaining container, an adsorption member using such an adsorbent, an ink supply system having such adsorption member, and an ink jet recording apparatus CANON KABUSHIKI KAISHA (JP) 2005-10-04 US disclosed
EP-0948997-B1 Manufacturing method of absorbent resin NIPPON CATALYTIC CHEM IND (JP) 2005-07-20 EP disclosed
US-20030117470-A1 Adsorbent for ink jet use, an ink retaining container, an adsorption member using such an adsorbent, an ink supply system having such adsorption member, and an ink jet recording apparatus CANON KABUSHIKI KAISHA 2003-06-26 US disclosed
US-6536884-B2 Adsorbent for ink jet use, an ink retaining container, an adsorption member using such adsorbent, an ink supply system having such adsorption member, and an ink jet recording apparatus CANON KABUSHIKI KAISHA (JP) 2003-03-25 US disclosed
US-6291636-B1 DRYING HYDROGEL OF A CROSSLINKED POLYMER; PULVERIZING; SEPARATING NIPPON SHOKUBAI CO., LTD. (JP) 2001-09-18 US disclosed
EP-0948997-A2 Manufacturing method of absorbent resin Nippon Shokubai Co., Ltd. (JP) 1999-10-13 EP disclosed
EP-0922584-A2 Adsorbent used in inkjet printing CANON KABUSHIKI KAISHA (JP) 1999-06-16 EP disclosed