SCHEMBL62650

SCHEMBL62650

CC(F)(F)[C](F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1027848 0.80
SCHEMBL1242903 0.76
SCHEMBL350244 0.76
SCHEMBL20274330 0.76
SCHEMBL350243 0.76
SCHEMBL1320184 0.74
SCHEMBL726194 0.73
SCHEMBL3100003 0.73
SCHEMBL8072632 0.73
SCHEMBL8072630 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3063 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024146383-A1 CYP11A1 INHIBITOR COMPOUND, AND PREPARATION METHOD THEREFOR AND USE THEREOF 上海闻耐医药科技有限公司 2024-07-11 WO claimed
CN-118307519-A CYP11A1 inhibitor compound, preparation method and application thereof 上海闻耐医药科技有限公司 2024-07-09 CN claimed
WO-2024138977-A1 HYBRID EMULSION AND PREPARATION METHOD THEREFOR 上海华谊三爱富新材料有限公司 2024-07-04 WO claimed
US-20240209292-A1 LACQUER FOR TREATING 3D PRINTING-CREATED PRINTED MATTER LUVANTIX ADM., CO. LTD (KR) 2024-06-27 US claimed
CN-118240139-A Alkali-soluble resin, photoresist composition and application thereof 固安鼎材科技有限公司 2024-06-25 CN claimed
CN-118234766-A Polymer compound and use thereof 株式会社三养社 2024-06-21 CN claimed
CN-116034147-B Adhesive composition containing antistatic agent and surface protective film 株式会社LG化学 2024-04-05 CN claimed
CN-117659413-A Composite solid electrolyte precursor, composite solid electrolyte and all-solid-state lithium battery 合肥市赛纬电子材料有限公司 2024-03-08 CN claimed
US-20240010875-A1 ADHESIVE COMPOSITION AND SURFACE PROTECTION FILM XINMEI FONTANA HOLDING (HONG KONG) LIMITED (CN) 2024-01-11 US claimed
CN-114478924-B Organic dielectric material, composite film, and preparation method and application thereof 华南师范大学 2024-01-09 CN claimed
EP-0588533-A2 Printed thermoplastic resin products and method for printing such products HAYAKAWA RUBBER COMPANY LIMITED (JP) 1994-03-23 EP claimed
EP-0588105-A1 Derivatives of Phosphoryloxypyrazole BAYER AG (DE) 1994-03-23 EP claimed
EP-0588534-A2 Radiation curing ink HAYAKAWA RUBBER COMPANY LIMITED (JP) 1994-03-23 EP claimed
US-5168032-A High sensitivity to visible light FUJI PHOTO FILM CO., LTD. (JP) 1992-12-01 US claimed
EP-0303244-B1 PROCESS FOR PREPARATION OF RUBBER LAMINATES NIPPON ZEON CO., LTD. (JP) 1992-01-22 EP claimed
EP-0454165-A2 New polymers, optical transmitting systems and optical members and their use HITACHI, LTD. (JP) 1991-10-30 EP claimed
US-5026583-A Process for preparation of rubber laminates NIPPON ZEON CO., LTD. (JP) 1991-06-25 US claimed
EP-0303244-A2 Process for preparation of rubber laminates NIPPON ZEON CO., LTD. (JP) 1989-02-15 EP claimed
EP-0269223-A2 Heat resisting plastic optical fibre and method for its manufacture TORAY INDUSTRIES, INC. (JP) 1988-06-01 EP claimed
EP-0060697-B1 HETEROCYCLIC DERIVATIVES IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1986-12-30 EP claimed