SCHEMBL627732

SCHEMBL627732

CCCCCCCCCCCC[n+]1ccccc1C

nearest known ligand 0.81

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 8/20 0.81
NPC1 O15118 6/20 0.81
RAB9A P51151 6/20 0.81
POLB P06746 1/20 0.81
HTT P42858 7/20 0.57
KMT2A Q03164 6/20 0.57
KDM4E B2RXH2 5/20 0.57
MEN1 O00255 5/20 0.57
NPSR1 Q6W5P4 3/20 0.57
LMNA P02545 3/20 0.57
MAPK1 P28482 3/20 0.57
RAD52 P43351 3/20 0.57
HSP90AA1 P07900 2/20 0.57
RGS12 O14924 1/20 0.57
USP2 O75604 1/20 0.57
THRB P10828 1/20 0.57
MCL1 Q07820 1/20 0.57
ALDH1A1 P00352 4/20 0.50
GAA P10253 4/20 0.50
CYP1A2 P05177 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29561275 1.00 SMN1; SMN2 (0.81) SMN1; SMN2NPC1RAB9APOLBHTT
SCHEMBL4070988 1.00 SMN1; SMN2 (0.81) SMN1; SMN2NPC1RAB9APOLBHTT
SCHEMBL29561014 1.00 SMN1; SMN2 (0.81) SMN1; SMN2NPC1RAB9APOLBHTT
SCHEMBL2864666 1.00 SMN1; SMN2 (0.81) SMN1; SMN2NPC1RAB9APOLBHTT
SCHEMBL627771 1.00 SMN1; SMN2 (0.81) SMN1; SMN2NPC1RAB9APOLBHTT
SCHEMBL2872475 1.00 SMN1; SMN2 (0.81) SMN1; SMN2NPC1RAB9APOLBHTT
SCHEMBL627235 1.00 SMN1; SMN2 (0.81) SMN1; SMN2NPC1RAB9APOLBHTT
SCHEMBL2867042 1.00 SMN1; SMN2 (0.81) SMN1; SMN2NPC1RAB9APOLBHTT
SCHEMBL628536 1.00 SMN1; SMN2 (0.81) SMN1; SMN2NPC1RAB9APOLBHTT
SCHEMBL29404607 1.00 SMN1; SMN2 (0.81) SMN1; SMN2NPC1RAB9APOLBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 245 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1006374-B1 Process for producing a resin having a large refractive index MITSUBISHI GAS CHEMICAL CO (JP) 2009-01-07 EP claimed
WO-2007088152-A1 PROCESS FOR PREPARING ISOCYANATES BASF SE (DE) 2007-08-09 WO claimed
EP-4703496-A1 ETCHING COMPOSITION COMPRISING AT LEAST ONE IONIC LIQUID AND AT LEAST ONE LACTAMIDE AND PROCESS FOR COATING PLASTIC SURFACES WITH METALS BY USING THE SAME BASF SE (DE) 2026-03-04 EP disclosed
US-12077631-B2 Bulk polymerisation of polyoxazolidone BASF SE (DE) 2024-09-03 US disclosed
WO-2024146848-A1 CURABLE MATERIALS BASED ON CYCLIC THIOETHER COMPOUNDS, AND USES THEREOF DELO INDUSTRIE KLEBSTOFFE GMBH & CO. KGAA (DE) 2024-07-11 WO disclosed
CN-112424253-B Bulk polymerization of polyoxazolidinones 巴斯夫欧洲公司 2024-02-27 CN disclosed
WO-2023248627-A1 WATER-BASED RESINOUS LIQUID AND WATER-BASED RESINOUS COATING MATERIAL 冨士色素株式会社 2023-12-28 WO disclosed
WO-2023166552-A1 PLATING SOLUTION CONTAINING SULFONIO GROUP-CONTAINING ETHER COMPOUND 株式会社JCU 2023-09-07 WO disclosed
US-20230038219-A1 TIN OR TIN ALLOY ELECTROPLATING SOLUTION, METHOD FOR FORMING BUMPS, AND METHOD FOR PRODUCING CIRCUIT BOARD MITSUBISHI MATERIALS CORPORATION (JP) 2023-02-09 US disclosed
EP-4098777-A1 TIN OR TIN ALLOY ELECTROPLATING SOLUTION, METHOD FOR FORMING BUMPS, AND METHOD FOR PRODUCING CIRCUIT BOARD Mitsubishi Materials Corporation (JP) 2022-12-07 EP disclosed
EP-3824012-B1 BULK POLYMERISATION OF POLYOXAZOLIDONE BASF SE (DE) 2022-09-07 EP disclosed
EP-0207732-B1 PLATING BATH AND METHOD FOR ELECTROPLATING TIN AND/OR LEAD MCGEAN-ROHCO, INC. (US) 1992-02-12 EP disclosed
EP-0196232-B1 PLATING BATH AND METHOD FOR ELECTROPLATING TIN AND/OR LEAD MCGEAN-ROHCO, INC. (US) 1991-11-21 EP disclosed
US-4885064-A SOLUBLE TIN, LEAD OR ALLOY SALT AND APHA-ACETYLINIC ALCOHOL OR GLYCOL; SMOOTH, LEVEL, MATTE OR BRIGHT MCGEAN-ROHCO, INC. (US) 1989-12-05 US disclosed
US-4662999-A Plating bath and method for electroplating tin and/or lead MCGEAN-ROHCO, INC. (US) 1987-05-05 US disclosed
EP-0207732-A1 Plating bath and method for electroplating tin and/or lead MCGEAN-ROHCO, INC. (US) 1987-01-07 EP disclosed
EP-0196232-A2 Plating bath and method for electroplating tin and/or lead MCGEAN-ROHCO, INC. (US) 1986-10-01 EP disclosed
US-4582576-A LEAD OR TIN SALT A SULFONIC ACID, SURFACTANT, AND BRIGHTENERS MCGEAN-ROHCO, INC. (US) 1986-04-15 US disclosed
US-4459185-A SURFACTANT, LEVELING AGENTS OBATA, DONI, DAIWA, FINE CHEMICALS CO., LTD. (JP) 1984-07-10 US disclosed
US-4402859-A Process for producing diarylamine antioxidants in globular form SUMITOMO CHEMICAL CO., LTD. (JP) 1983-09-06 US disclosed