Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Diethyl Sulfide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15147419 | 0.75 | — | — | |
| Diethyl Sulfide SCHEMBL11391850 | 0.73 | — | — | |
| Alcohol SCHEMBL2689352 | 0.72 | — | — | |
| Tetrylammonium SCHEMBL36889 | 0.69 | TSHR (0.57) | TSHRMEN1KMT2AALDH1A1 | |
| SCHEMBL11333797 | 0.69 | TSHR (0.47) | TSHRMEN1KMT2AALDH1A1 | |
| Diethyl Sulfide SCHEMBL25414913 | 0.69 | — | — | |
| Diethyl Sulfide SCHEMBL2152967 | 0.69 | — | — | |
| Diethyl Sulfide SCHEMBL28138832 | 0.69 | — | — | |
| Diethyl Sulfide SCHEMBL28201297 | 0.69 | — | — | |
| Diethyl Sulfide SCHEMBL27651526 | 0.69 | TSHR (0.32) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6965045-B2 | Organic metal precursor for use in forming metal containing patterned films | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-11-15 | — | — | US | disclosed |
| US-20030124457-A1 | Organic metal precursor for use in forming metal containing patterned films | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-07-03 | — | — | US | disclosed |
| EP-1323721-A2 | Organic metal precursor for use in forming metal-containing patterned films | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-07-02 | — | — | EP | disclosed |