⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL466393 | 0.90 | — | — | |
| Tetrafluoroethylene SCHEMBL1712591 | 0.88 | — | — | |
| SCHEMBL12039758 | 0.88 | — | — | |
| Potassium SCHEMBL31276116 | 0.88 | — | — | |
| Ammonia Solution, Strong SCHEMBL814406 | 0.88 | — | — | |
| SCHEMBL1182002 | 0.88 | — | — | |
| SCHEMBL31275421 | 0.88 | — | — | |
| Lithium SCHEMBL31276092 | 0.88 | — | — | |
| SCHEMBL29357822 | 0.87 | — | — | |
| SCHEMBL11219088 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6855476-B2 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-02-15 | — | — | US | disclosed |
| US-20020197558-A1 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2002-12-26 | — | — | US | disclosed |