SCHEMBL6287213

SCHEMBL6287213

O=C(OC(=O)S(=O)(=O)C(=O)OC(=O)Oc1ccccc1)Oc1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.41
ATM Q13315 2/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
ALOX15 P16050 2/20 0.40
HPGD P15428 1/20 0.40
HSD17B10 Q99714 1/20 0.40
MAPT P10636 5/20 0.40
ALDH1A1 P00352 2/20 0.40
KMT2A Q03164 2/20 0.40
PPARG P37231 1/20 0.40
NCOA2 Q15596 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
RXFP1 Q9HBX9 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.39
PTGES O14684 1/20 0.38
USP2 O75604 1/20 0.38
KDM4E B2RXH2 1/20 0.38
NSD2 O96028 1/20 0.38
MEN1 O00255 1/20 0.38
CA1 P00915 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17512016 0.96 TDP1 (0.39) TDP1ATML3MBTL1ALOX15HPGD
SCHEMBL104971 0.83 TDP1 (0.47) TDP1ATML3MBTL1ALOX15HPGD
SCHEMBL1193990 0.83 TDP1 (0.50) TDP1ATML3MBTL1ALOX15HPGD
SCHEMBL4588122 0.81 TDP1 (0.48) TDP1ATML3MBTL1ALOX15HPGD
SCHEMBL2496279 0.79 TDP1 (0.47) TDP1ATML3MBTL1ALOX15HPGD
SCHEMBL9241160 0.78 TDP1 (0.54) TDP1ATML3MBTL1ALOX15HPGD
SCHEMBL9353461 0.78 TDP1 (0.54) TDP1ATML3MBTL1ALOX15HPGD
SCHEMBL9353455 0.78 TDP1 (0.54) TDP1ATML3MBTL1ALOX15HPGD
SCHEMBL18073 0.78 TDP1 (0.54) TDP1ATML3MBTL1ALOX15HPGD
SCHEMBL27352197 0.78 TDP1 (0.54) TDP1ATML3MBTL1ALOX15HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109648970-A A kind of Kapton of ultralow dielectric loss 深圳瑞华泰薄膜科技股份有限公司 2019-04-19 CN claimed
CN-109651631-A A kind of Kapton of low dielectric loss 深圳瑞华泰薄膜科技股份有限公司 2019-04-19 CN claimed
CN-103904271-A Preparation method of high-performance composite diaphragm and composite diaphragm SHENZHEN SENIOR TECHNOLOGY MATERIAL CO LTD 2014-07-02 CN claimed
JP-5345823-A None JP disclosed
CN-111373318-B Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学株式会社 2023-06-09 CN disclosed
CN-108137803-B Resin, composition, cured film, method for producing cured film, and semiconductor device 富士胶片株式会社 2020-04-17 CN disclosed
CN-109651631-A A kind of Kapton of low dielectric loss 深圳瑞华泰薄膜科技股份有限公司 2019-04-19 CN disclosed
CN-109648970-A A kind of Kapton of ultralow dielectric loss 深圳瑞华泰薄膜科技股份有限公司 2019-04-19 CN disclosed
CN-106873249-B Light alignment materials with side draw generation 罗利克有限公司 2018-09-14 CN disclosed
CN-107011924-A Light alignment materials with side draw generation 罗利克有限公司 2017-08-04 CN disclosed
CN-106873249-A Light alignment materials with side draw generation 罗利克有限公司 2017-06-20 CN disclosed
CN-103904271-A Preparation method of high-performance composite diaphragm and composite diaphragm SHENZHEN SENIOR TECHNOLOGY MATERIAL CO LTD 2014-07-02 CN disclosed
US-8729402-B2 Polyimide precursor composition, use of the of the same, and production method of the same KANEKA CORPORATION (JP) 2014-05-20 US disclosed
US-20130184385-A1 NEGATIVE ELECTRODE FOR LITHIUM-ION SECONDARY BATTERY, AND MANUFACTURING METHOD FOR SAME NISSAN MOTOR CO., LTD. (JP) 2013-07-18 US disclosed
US-20110061914-A1 NOVEL POLYIMIDE PRECURSOR COMPOSITION, USE OF THE SAME, AND PRODUCTION METHOD OF THE SAME KANEKA CORPORATION (JP) 2011-03-17 US disclosed
US-6962744-B2 Bifunctional phenylene ether oligomer, its derivatives, its use and process for the production thereof MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2005-11-08 US disclosed
US-20040214004-A1 Bifunctional phenylene ether oligomer, its derivatives, its use and process for the production thereof AMAGAI AKIKAZU (JP) 2004-10-28 US disclosed
JP-H05345823-A POLYIMIDE RESIN TOYOBO CO LTD 1993-12-27 JP disclosed