SCHEMBL628852

SCHEMBL628852

C[SiH](C)O[SiH](C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12396029 0.94
SCHEMBL10316333 0.94
SCHEMBL20078066 0.94
SCHEMBL10358218 0.90
SCHEMBL510967 0.86
SCHEMBL12015642 0.83
SCHEMBL12168720 0.83
SCHEMBL12168711 0.83
SCHEMBL3870741 0.83
SCHEMBL2107500 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0586845-B1 Method of bonding using polycarborane siloxane polymers HUGHES AIRCRAFT CO (US) 1997-09-03 EP claimed
US-9434750-B2 Branched siloxanes and methods for synthesis BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) 2016-09-06 US disclosed
US-20160152842-A1 INSULATING LAYER-FORMING COMPOSITION AND USE THEREOF HILTI AKTIENGESELLSCHAFT (LI) 2016-06-02 US disclosed
US-20150274757-A1 Branched Siloxanes And Methods For Synthesis BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM 2015-10-01 US disclosed
US-9093625-B2 Curable composition for encapsulating optical semiconductor and optical semiconductor apparatus using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-28 US disclosed
US-8906153-B2 Product of polysiloxane condensation ASAHI KASEI E-MATERIALS CORPORATION (JP) 2014-12-09 US disclosed
US-20140350176-A1 Hydrophilic Silicone Gel Adhesives DOW CORNING TAIWAN INC. (TW) 2014-11-27 US disclosed
US-20140350278-A1 Polymerizable Hybrid Polysiloxanes and Preparation DOW CORNING TAIWAN INC. (TW) 2014-11-27 US disclosed
US-8749130-B2 Nanocrystal doped matrixes SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-06-10 US disclosed
US-20130281713-A1 BRANCHED SILOXANES AND METHODS FOR SYNTHESIS BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM (US) 2013-10-24 US disclosed
US-20090206453-A1 Method for Preparing Modified Porous Silica Films, Modified Porous Silica Films Prepared According to This Method and Semiconductor Devices Fabricated Using the Modified Porous Silica Films ULVAC, INC. (JP) 2009-08-20 US disclosed
US-20090186210-A1 PRECURSOR COMPOSITION FOR POROUS THIN FILM, METHOD FOR PREPARATION OF THE PRECURSOR COMPOSITION, POROUS THIN FILM, METHOD FOR PREPARATION OF THE POROUS THIN FILM, AND SEMICONDUCTOR DEVICE ULVAC. INC. (JP) 2009-07-23 US disclosed
US-20090053503-A1 Precursor composition for porous film and method for preparing the composition, porous film and method for preparing the porous film, and semiconductor device NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2009-02-26 US disclosed
EP-2025709-A1 PRECURSOR COMPOSITION FOR POROUS MEMBRANE, PROCESS FOR PREPARATION OF THE PRECURSOR COMPOSITION, POROUS MEMBRANE, PROCESS FOR PRODUCTION OF THE POROUS MEMBRANE, AND SEMICONDUCTOR DEVICE ULVAC, INC. (JP) 2009-02-18 EP disclosed
EP-1867687-A1 PRECURSOR COMPOSITION FOR POROUS MEMBRANE AND PROCESS FOR PREPARATION THEREOF, POROUS MEMBRANE AND PROCESS FOR PRODUCTION THEREOF, AND SEMICONDUCTOR DEVICE ULVAC, INC. (JP) 2007-12-19 EP disclosed
EP-1855313-A1 PROCESS FOR PRODUCING MODIFIED POROUS SILICA FILM, MODIFIED POROUS SILICA FILM OBTAINED BY THE PROCESS, AND SEMICONDUCTOR DEVICE EMPLOYING THE MODIFIED POROUS SILICA FILM ULVAC, INC. (JP) 2007-11-14 EP disclosed
US-20060040110-A1 Method of modifying porous film, modified porous film and use of same MITSUI CHEMICALS, INC. (JP) 2006-02-23 US disclosed
EP-0614946-B1 Curable composition KANEGAFUCHI CHEMICAL IND (JP) 1998-10-21 EP disclosed
US-5449734-A Hydrosilane, unsaturated silicone compound, platinum catalyst, siloxane KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1995-09-12 US disclosed
EP-0614946-A1 Curable composition KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1994-09-14 EP disclosed