Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DAO | P14920 | 7/20 | 0.58 |
| ▸ | PKM | P14618 | 1/20 | 0.47 |
| ▸ | LIG1 | P18858 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | PPARG | P37231 | 1/20 | 0.42 |
| ▸ | NCOA2 | Q15596 | 1/20 | 0.42 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.42 |
| ▸ | NCOA3 | Q9Y6Q9 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | HPGDS | O60760 | 1/20 | 0.39 |
| ▸ | MKNK1 | Q9BUB5 | 1/20 | 0.39 |
| ▸ | MKNK2 | Q9HBH9 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL70493 | 0.84 | DAO (0.67) | DAOPKMLIG1MEN1POLB | |
| SCHEMBL1303016 | 0.84 | NPSR1 (0.60) | DAOPKMLIG1NPSR1LMNA | |
| SCHEMBL28512116 | 0.83 | DAO (0.43) | DAOPKMLIG1POLBRAB9A | |
| SCHEMBL29808747 | 0.82 | DAO (0.64) | DAOPKMLIG1MEN1POLB | |
| SCHEMBL19987844 | 0.82 | DAO (0.64) | DAOPKMLIG1MEN1POLB | |
| SCHEMBL28343181 | 0.82 | DAO (0.64) | DAOPKMLIG1MEN1POLB | |
| SCHEMBL11598753 | 0.82 | DAO (0.64) | DAOPKMLIG1MEN1POLB | |
| Hydrochloric Acid SCHEMBL3074364 | 0.82 | DAO (0.64) | DAOPKMLIG1MEN1POLB | |
| Hydrochloric Acid SCHEMBL1979156 | 0.82 | DAO (0.64) | DAOPKMLIG1MEN1POLB | |
| SCHEMBL28353716 | 0.82 | DAO (0.64) | DAOPKMLIG1MEN1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109790292-A | Process for preparing polybenzazole polymer (P) | 巴斯夫欧洲公司 | 2019-05-21 | — | — | CN | claimed |
| CN-111836849-B | Process for producing fibers, films and moldings of polybenzazole polymer (P) | 巴斯夫欧洲公司 | 2023-04-07 | — | — | CN | disclosed |
| CN-109790292-B | Process for preparing polybenzazole polymer (P) | 巴斯夫欧洲公司 | 2022-05-31 | — | — | CN | disclosed |
| EP-3762447-A1 | METHOD FOR PRODUCING FIBRES, FILMS AND MOULDED BODIES OF A POLYBENZAZOLE POLYMER (P) | BASF SE (DE) | 2021-01-13 | — | — | EP | disclosed |
| US-20200407508-A1 | METHOD FOR PRODUCING FIBERS, FILMS AND MOLDINGS OF A POLYBENZAZOLE POLYMER (P) | BASF SE (DE) | 2020-12-31 | — | — | US | disclosed |
| CN-111836849-A | Process for producing fibers, films and moldings of polybenzazole polymer (P) | 巴斯夫欧洲公司 | 2020-10-27 | — | — | CN | disclosed |
| WO-2019170529-A1 | METHOD FOR PRODUCING FIBRES, FILMS AND MOULDED BODIES OF A POLYBENZAZOLE POLYMER (P) | BASF SE (DE) | 2019-09-12 | — | — | WO | disclosed |
| CN-109790292-A | Process for preparing polybenzazole polymer (P) | 巴斯夫欧洲公司 | 2019-05-21 | — | — | CN | disclosed |
| US-6911291-B2 | Recording material having a negative-working, radiation-sensitive layer which comprises additives for promoting developability | AGFA-GEVAERT (BE) | 2005-06-28 | — | — | US | disclosed |
| US-6783913-B2 | POLYMERIC ACETAL RESIN CONTAINS UNITS (A), (B), (C), (D), AND (E). UNIT (A) IS A VINYL ALCOHOL UNIT. UNIT; (B) IS A POLYVINYL ACETAL UNIT CONTAINING AN R GROUP, WHERE R IS HYDROGEN, AN ALIPHATIC GROUP, AN AROMATIC GROUP, OR AN | KODAK POLYCHROME GRAPHICS LLC | 2004-08-31 | — | — | US | disclosed |
| EP-1199605-A1 | Recording material having a pigment-coloured radiation-sensitive layer | Agfa-Gevaert (BE) | 2002-04-24 | — | — | EP | disclosed |
| US-6197472-B1 | FOR OFFSET PRINTING; PRINTING PLATES | AFGA-GEVAERT N.V. (BE) | 2001-03-06 | — | — | US | disclosed |
| EP-0752430-B1 | Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates | KODAK POLYCHROME GRAPHICS LLC (US) | 2000-09-20 | — | — | EP | disclosed |
| US-5985996-A | POLYMER BINDER OF COPOLYMERS OF VINYL ALCOHOL, VINYL ESTER AND ACETAL RESINS | KODAK POLYCHROME GRAPHICS LLC (US) | 1999-11-16 | — | — | US | disclosed |
| US-5925491-A | POLYVINYLACETAL RESINS CONTAIN AMIDATED POLYVINYLAMINE UNITS; IMPROVED INK ACCEPTANCE, DEVELOPABILITY, WETTING, HIGH PHOTOSENSITIVITY, GOOD IMAGE RESOLUTION AND LARGER PRINTING RUNS | KODAK POLYCHROME GRAPHICS LLC (US) | 1999-07-20 | — | — | US | disclosed |
| US-5700619-A | PHOTOSENSITIVE COMPOSITION COMPRISING DIAZONIUM POLYCONDENSATION PRODUCT AND/OR FREE RADICAL POLYMERIZABLE SYSTEM CONSISTING OF PHOTOINITIATORS AND POLYMERIZABLE COMPONENTS, POLYVINYL ACETAL BINDER HAVING FREE ACID GROUP | SUN CHEMICAL CORPORATION (US) | 1997-12-23 | — | — | US | disclosed |
| EP-0752430-A2 | Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates | SUN CHEMICAL CORPORATION (US) | 1997-01-08 | — | — | EP | disclosed |
| US-5143813-A | Lithographic printing plates, aromatic-aldehyde resin containing diazonium groups | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-09-01 | — | — | US | disclosed |
| US-5126504-A | Easily strippable | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-06-30 | — | — | US | disclosed |
| US-5045429-A | Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-09-03 | — | — | US | disclosed |