SCHEMBL6295220

SCHEMBL6295220

C=CC=C(N)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ AKT1 P31749 1/20 0.43
▸ TSHR P16473 3/20 0.42
▸ BLM P54132 2/20 0.42
▸ RECQL P46063 2/20 0.42
▸ TDP1 Q9NUW8 2/20 0.42
▸ POLB P06746 2/20 0.42
▸ F2 P00734 1/20 0.42
▸ F10 P00742 1/20 0.42
▸ F12 P00748 1/20 0.42
▸ F7 P08709 1/20 0.42
▸ F3 P13726 1/20 0.42
▸ PKM P14618 1/20 0.42
▸ CYP3A4 P08684 1/20 0.42
▸ PARP1 P09874 1/20 0.42
▸ MAPT P10636 1/20 0.42
▸ CYP2C19 P33261 1/20 0.42
▸ PMP22 Q01453 1/20 0.42
▸ HSD17B10 Q99714 1/20 0.42
▸ L3MBTL1 Q9Y468 1/20 0.42
▸ KMT2A Q03164 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14138447 0.85 BLM (0.43) AKT1TSHRBLMRECQLTDP1
SCHEMBL13799193 0.80 AKT1 (0.35) AKT1TSHRBLMRECQLTDP1
SCHEMBL15444731 0.80 AKT1 (0.35) AKT1TSHRBLMRECQLTDP1
SCHEMBL15683852 0.78 BLM (0.44) TSHRBLMRECQLTDP1POLB
SCHEMBL13799182 0.77 AKT1 (0.41) AKT1TSHRBLMRECQLTDP1
SCHEMBL4713676 0.76 TDP1 (0.48) AKT1TSHRBLMRECQLTDP1
SCHEMBL4535484 0.76 F2 (0.48) TSHRBLMRECQLTDP1POLB
SCHEMBL27534885 0.76 TDP1 (0.48) AKT1TSHRBLMRECQLTDP1
SCHEMBL5982601 0.75 BLM (0.46) AKT1TSHRBLMRECQLTDP1
SCHEMBL57798 0.75 AKT1 (0.46) AKT1TSHRBLMRECQLTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118791484-A Carbonyl modified imidazo [1, 2-alpha ] pyridine fluorescent probe molecule and preparation method and application thereof 郑州大学 2024-10-18 — — CN claimed
EP-0107792-A1 Photopolymerizable compositions MITSUBISHI KASEI CORPORATION (JP) 1984-05-09 — — EP claimed
CN-118791484-A Carbonyl modified imidazo [1, 2-alpha ] pyridine fluorescent probe molecule and preparation method and application thereof 郑州大学 2024-10-18 — — CN disclosed
US-20050158663-A1 Regenerative plate making and printing process, and plate making and printing apparatus MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2005-07-21 — — US disclosed
US-6877428-B2 Regenerative plate making and printing process, and plate making and printing apparatus MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2005-04-12 — — US disclosed
US-6861202-B2 Method for treating photosensitive lithographic printing plate LASTRA S.P.A. (IT) 2005-03-01 — — US disclosed
US-6727307-B2 A DIENE HOMO OR COPOLYMER SYNTHESIZED THROUGH AN EMULSION POLYMERIZATION, HAVING A POLAR GROUP IN ITS MOLECULE AS A RUBBER COMPONENT AND A SILICON OXIDE CONTAINING INORGANIC FILLER BRIDGESTONE CORPORATION (JP) 2004-04-27 — — US disclosed
US-20030194654-A1 Method for treating photosensitive lithographic printing plate MITSUBISHI CHEMICAL CORPORATION (JP) 2003-10-16 — — US disclosed
US-20030172828-A1 Regenerative plate making and printing process, and plate making and printing apparatus MITSUBISHI HEAVY INDUSTRIES PRINTING & PACKAGING MACHINERY, LTD. (JP) 2003-09-18 — — US disclosed
US-6558875-B1 Exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment using a mercury lamp MITSUBISHI CHEMICAL CORPORATION (JP) 2003-05-06 — — US disclosed
EP-1287986-A1 METHOD AND DEVICE FOR REGENERATIVE PROCESSING AND PRINTING MITSUBISHI CHEMICAL CORPORATION (JP) 2003-03-05 — — EP disclosed
US-5723260-A LIGHT SENSITIVE ELEMENTS AND STORAGE STABILITY MITSUBISHI CHEMICAL CORPORATION (JP) 1998-03-03 — — US disclosed
US-5686231-A Process for disposing of developer for pigment-containing non-silver-salt photo sensitive material, apparatus therefor and automatic developing system MITSUBISHI CHEMICAL CORPORATION (JP) 1997-11-11 — — US disclosed
EP-0793145-A1 Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it MITSUBISHI CHEMICAL CORPORATION (JP) 1997-09-03 — — EP disclosed
EP-0763779-A2 Unsaturated group-containing urethane compound, photopolymerizable composition containing it, and photosensitive lithographic printing plate Mitsubishi Chemical Corporation (JP) 1997-03-19 — — EP disclosed
EP-0756204-A1 Photopolymerizable composition and photosensitive lithographic printing plate employing it MITSUBISHI CHEMICAL CORPORATION (JP) 1997-01-29 — — EP disclosed
EP-0747773-A1 METHOD AND APPARATUS FOR TREATING DEVELOPER FOR PIGMENT-CONTAINING NONSILVER PHOTOSENSITIVE MATERIAL, AND AUTOMATIC DEVELOPING MACHINE MITSUBISHI CHEMICAL CORPORATION (JP) 1996-12-11 — — EP disclosed
EP-0738929-A2 Photopolymerizable sensitive material Mitsubishi Chemical Corporation (JP) 1996-10-23 — — EP disclosed
EP-0107792-A1 Photopolymerizable compositions MITSUBISHI KASEI CORPORATION (JP) 1984-05-09 — — EP disclosed
EP-0107792-A1 Photopolymerizable compositions MITSUBISHI KASEI CORPORATION (JP) 1984-05-09 — — EP disclosed
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