⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7593062 | 0.73 | — | — | |
| SCHEMBL4942856 | 0.73 | — | — | |
| SCHEMBL5791749 | 0.69 | — | — | |
| SCHEMBL2378261 | 0.65 | — | — | |
| SCHEMBL9842032 | 0.64 | — | — | |
| SCHEMBL21328504 | 0.64 | — | — | |
| SCHEMBL5791618 | 0.61 | — | — | |
| SCHEMBL16612572 | 0.61 | — | — | |
| SCHEMBL21679565 | 0.60 | — | — | |
| SCHEMBL22470342 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8906153-B2 | Product of polysiloxane condensation | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2014-12-09 | — | — | US | disclosed |
| EP-1867687-B9 | PRECURSOR COMPOSITION FOR POROUS MEMBRANE AND PROCESS FOR PREPARATION THEREOF, POROUS MEMBRANE AND PROCESS FOR PRODUCTION THEREOF, AND SEMICONDUCTOR DEVICE | ULVAC INC (JP) | 2013-09-18 | — | — | EP | disclosed |
| EP-1867687-B1 | PRECURSOR COMPOSITION FOR POROUS MEMBRANE AND PROCESS FOR PREPARATION THEREOF, POROUS MEMBRANE AND PROCESS FOR PRODUCTION THEREOF, AND SEMICONDUCTOR DEVICE | ULVAC INC (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-8394457-B2 | Precursor composition for porous thin film, method for preparation of the precursor composition, porous thin film, method for preparation of the porous thin film, and semiconductor device | ULVAC, INC. (JP) | 2013-03-12 | — | — | US | disclosed |
| EP-2447303-A1 | PRODUCT OF POLYSILOXANE CONDENSATION | Asahi Kasei E-Materials Corporation (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-20120100298-A1 | PRODUCT OF POLYSILOXANE CONDENSATION | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2012-04-26 | — | — | US | disclosed |
| EP-1547975-B1 | METHOD FOR MODIFYING POROUS FILM, MODIFIED POROUS FILM AND USE OF SAME | MITSUI CHEMICALS INC (JP) | 2012-02-22 | — | — | EP | disclosed |
| US-7807267-B2 | Method of modifying porous film, modified porous film and use of same | MITSUI CHEMICALS, INC. (JP) | 2010-10-05 | — | — | US | disclosed |
| US-20090206453-A1 | Method for Preparing Modified Porous Silica Films, Modified Porous Silica Films Prepared According to This Method and Semiconductor Devices Fabricated Using the Modified Porous Silica Films | ULVAC, INC. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090186210-A1 | PRECURSOR COMPOSITION FOR POROUS THIN FILM, METHOD FOR PREPARATION OF THE PRECURSOR COMPOSITION, POROUS THIN FILM, METHOD FOR PREPARATION OF THE POROUS THIN FILM, AND SEMICONDUCTOR DEVICE | ULVAC. INC. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090053503-A1 | Precursor composition for porous film and method for preparing the composition, porous film and method for preparing the porous film, and semiconductor device | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-2025709-A1 | PRECURSOR COMPOSITION FOR POROUS MEMBRANE, PROCESS FOR PREPARATION OF THE PRECURSOR COMPOSITION, POROUS MEMBRANE, PROCESS FOR PRODUCTION OF THE POROUS MEMBRANE, AND SEMICONDUCTOR DEVICE | ULVAC, INC. (JP) | 2009-02-18 | — | — | EP | disclosed |
| EP-1867687-A1 | PRECURSOR COMPOSITION FOR POROUS MEMBRANE AND PROCESS FOR PREPARATION THEREOF, POROUS MEMBRANE AND PROCESS FOR PRODUCTION THEREOF, AND SEMICONDUCTOR DEVICE | ULVAC, INC. (JP) | 2007-12-19 | — | — | EP | disclosed |
| EP-1855313-A1 | PROCESS FOR PRODUCING MODIFIED POROUS SILICA FILM, MODIFIED POROUS SILICA FILM OBTAINED BY THE PROCESS, AND SEMICONDUCTOR DEVICE EMPLOYING THE MODIFIED POROUS SILICA FILM | ULVAC, INC. (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-20060040110-A1 | Method of modifying porous film, modified porous film and use of same | MITSUI CHEMICALS, INC. (JP) | 2006-02-23 | — | — | US | disclosed |
| EP-1547975-A1 | METHOD FOR MODIFYING POROUS FILM, MODIFIED POROUS FILM AND USE OF SAME | Mitsui Chemicals, Inc. (JP) | 2005-06-29 | — | — | EP | disclosed |