⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14891117 | 0.72 | — | — | |
| SCHEMBL7990154 | 0.67 | — | — | |
| SCHEMBL14891058 | 0.65 | — | — | |
| SCHEMBL13393750 | 0.65 | — | — | |
| SCHEMBL14891742 | 0.64 | — | — | |
| SCHEMBL9534865 | 0.61 | — | — | |
| SCHEMBL13241538 | 0.61 | — | — | |
| SCHEMBL818866 | 0.61 | — | — | |
| SCHEMBL18827890 | 0.61 | — | — | |
| SCHEMBL6874230 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6913867-B2 | Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern | KANSAI PAINT CO., LTD. (JP) | 2005-07-05 | — | — | US | disclosed |
| US-20020068237-A1 | Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern | KANSAI PAINT CO., LTD. (JP) | 2002-06-06 | — | — | US | disclosed |