Sulfur Hexafluoride

Sulfur Hexafluoride

SCHEMBL6300295

F.FS(F)(F)(F)(F)F

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118610085-A Method for forming trench structure and semiconductor process equipment 北京北方华创微电子装备有限公司 2024-09-06 CN disclosed
CN-209102671-U A kind of chromatograph detecting sulfur hexafluoride decomposition product 国网重庆市电力公司电力科学研究院 2019-07-12 CN disclosed
CN-109358126-A A kind of chromatograph detecting sulfur hexafluoride decomposition product 国网重庆市电力公司电力科学研究院 2019-02-19 CN disclosed
CN-108872408-A A kind of SF6Gas live detection method 国家电网公司 2018-11-23 CN disclosed
CN-107487769-A A kind of method that oil-soluble fluorinated graphene is prepared using fluoride supercritical fluid 辽宁兰晶科技有限公司 2017-12-19 CN disclosed
CN-107487769-A A kind of method that oil-soluble fluorinated graphene is prepared using fluoride supercritical fluid 辽宁兰晶科技有限公司 2017-12-19 CN disclosed
CN-205028729-U Disk insulating part for high -Voltage electrical appliances SHANDONG ELECTRIC POWER ENGINEERING CONSULTING INST CO LTD 2016-02-10 CN disclosed
US-6877517-B2 Plasma etch method for forming plasma etched silicon layer CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) 2005-04-12 US disclosed
US-6790374-B1 Plasma etch method for forming plasma etched silicon layer CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) 2004-09-14 US disclosed
US-20040110389-A1 Plasma etch method for forming plasma etched silicon layer CHARTERED SEMICONDUCTOR MANUFACTURING LTD. 2004-06-10 US disclosed
US-6444505-B1 Thin film transistor (TFT) structure with planarized gate electrode INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2002-09-03 US disclosed