SCHEMBL63105

SCHEMBL63105

C=CC(=O)OC(C)O[Si](OC(C)OC(=O)C=C)(OC(C)OC(=O)C=C)OC(C)OC(=O)C=C

nearest known ligand 0.42

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.42
HPGD P15428 1/20 0.32
ALDH1A1 P00352 4/20 0.31
TP53 P04637 2/20 0.31
HIF1A Q16665 2/20 0.31
CYP3A4 P08684 1/20 0.31
HSD17B10 Q99714 1/20 0.31
HCAR2 Q8TDS4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL734060 0.85 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL999848 0.85 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL2727797 0.84 TSHR (0.50) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL27509148 0.80 TSHR (0.37) TSHR
SCHEMBL8863644 0.80 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL27740665 0.80 TSHR (0.37) TSHR
SCHEMBL2134306 0.79 TSHR (0.46) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL1805548 0.79 TSHR (0.40) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL11802268 0.79 TSHR (0.40) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9159446 0.77 HCAR2 (0.46) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250189888-A1 PHOTOACTIVABLE HYBRID ORGANIC-INORGANIC SOL-GEL RESIN FOR 3D PRINTING CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) 2025-06-12 US claimed
EP-4490575-A1 PHOTOACTIVABLE HYBRID ORGANIC-INORGANIC SOL-GEL RESIN FOR 3D PRINTING TotalEnergies One Tech (FR) 2025-01-15 EP claimed
WO-2023170438-A1 PHOTOACTIVABLE HYBRID ORGANIC-INORGANIC SOL-GEL RESIN FOR 3D PRINTING TOTALENERGIES ONE TECH (FR) 2023-09-14 WO claimed
US-20150056383-A1 High Resolution Printing INTRINSIQ MATERIALS LTD. (GB) 2015-02-26 US claimed
JP-5086308-A None JP disclosed
US-20250189888-A1 PHOTOACTIVABLE HYBRID ORGANIC-INORGANIC SOL-GEL RESIN FOR 3D PRINTING CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) 2025-06-12 US disclosed
EP-4490575-A1 PHOTOACTIVABLE HYBRID ORGANIC-INORGANIC SOL-GEL RESIN FOR 3D PRINTING TotalEnergies One Tech (FR) 2025-01-15 EP disclosed
WO-2023170438-A1 PHOTOACTIVABLE HYBRID ORGANIC-INORGANIC SOL-GEL RESIN FOR 3D PRINTING TOTALENERGIES ONE TECH (FR) 2023-09-14 WO disclosed
WO-2023169566-A1 CATALYST FOR PHOTOCATALYTIC POLYMERIZATION REACTION, AND APPLICATION THEREOF 北京服装学院 2023-09-14 WO disclosed
US-20150299451-A1 Photocurable Resin Composition, Multilayer Sheet, Molded Multilayer Article, and Method for Producing Molded Multilayer Article MITSUBISHI RAYON CO., LTD. (JP) 2015-10-22 US disclosed
EP-2910583-A1 PHOTOCURABLE RESIN COMPOSITION, MULTILAYER SHEET, MOLDED MULTILAYER ARTICLE, AND METHOD FOR PRODUCING MOLDED MULTILAYER ARTICLE Mitsubishi Rayon Co., Ltd. (JP) 2015-08-26 EP disclosed
US-8137803-B2 Multilayer structure polymer and resin composition together with acrylic resin film material, acrylic resin laminate film, photocurable acrylic resin film or sheet, laminate film or sheet and laminate molding obtained by laminating thereof MITSUBISHI RAYON CO., LTD. (JP) 2012-03-20 US disclosed
US-5664041-A Coating system for glass adhesion retention DSM DESOTECH, INC. (US) 1997-09-02 US disclosed
EP-0786440-A1 ARTIFICIAL MARBLE AND PROCESS FOR PRODUCING THE SAME MITSUBISHI RAYON CO., LTD. (JP) 1997-07-30 EP disclosed
EP-0534753-B1 Composite composition having high transparency and process for producing same MITSUBISHI RAYON CO (JP) 1996-12-18 EP disclosed
EP-0733027-A1 COATING SYSTEM FOR GLASS ADHESION RETENTION DSM N.V. (NL) 1996-09-25 EP disclosed
WO-1995015928-A2 COATING SYSTEM FOR GLASS ADHESION RETENTION DSM N.V. (NL) 1995-06-15 WO disclosed
US-5385988-A A curable blends consisting of an additional polymer and a polysilicates, polysiloxanes or polysilsesquioxanes in a dispersion system of colloidal silica to form rigid, tough interpenetrating polymer networks MITSUBISHI RAYON CO., LTD. (JP) 1995-01-31 US disclosed
JP-H0586308-A COATING COMPOSITION AND SURFACE-COATED ARTICLE MITSUBISHI RAYON CO LTD 1993-04-06 JP disclosed
EP-0534753-A1 Composite composition having high transparency and process for producing same MITSUBISHI RAYON CO., LTD. (JP) 1993-03-31 EP disclosed