SCHEMBL631316

SCHEMBL631316

O=C(O)C(=CC=Cc1ccccc1)CC1CO1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 1/20 0.52
MGLL Q99685 1/20 0.42
LMNA P02545 7/20 0.41
ALDH1A1 P00352 5/20 0.41
TRPA1 O75762 1/20 0.41
ALOX5 P09917 1/20 0.41
MAPK1 P28482 1/20 0.41
MCL1 Q07820 2/20 0.39
KMT2A Q03164 3/20 0.37
HDAC3 O15379 2/20 0.37
HDAC4 P56524 2/20 0.37
HDAC1 Q13547 2/20 0.37
HDAC7 Q8WUI4 2/20 0.37
HDAC2 Q92769 2/20 0.37
HDAC10 Q969S8 2/20 0.37
HDAC11 Q96DB2 2/20 0.37
HDAC8 Q9BY41 2/20 0.37
HDAC6 Q9UBN7 2/20 0.37
HDAC9 Q9UKV0 2/20 0.37
HDAC5 Q9UQL6 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL187416 0.86 GRIK1 (0.50) GRIK1MGLLLMNAALDH1A1TRPA1
SCHEMBL1774350 0.81 CYP3A4 (0.53) MGLLLMNAALDH1A1MAPK1KMT2A
SCHEMBL9261370 0.78 GRIK1 (0.51) GRIK1LMNAALDH1A1TRPA1ALOX5
SCHEMBL7261601 0.74 GRIK1 (0.45) GRIK1
SCHEMBL7261603 0.74 GRIK1 (0.45) GRIK1
SCHEMBL17335817 0.74
SCHEMBL5031405 0.74 GRIK1 (0.60) GRIK1LMNAALDH1A1TRPA1ALOX5
SCHEMBL5597302 0.74 GRIK1 (0.60) GRIK1LMNAALDH1A1TRPA1ALOX5
SCHEMBL221210 0.74 GRIK1 (0.60) GRIK1LMNAALDH1A1TRPA1ALOX5
SCHEMBL10394714 0.74 GRIK1 (0.60) GRIK1LMNAALDH1A1TRPA1ALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2703142-A1 Thermoplastic foam panel with reduced thermally induced warping BASF SE (DE) 2014-03-05 EP disclosed
EP-2420531-A1 Extrusion foams with improved rigidity BASF SE (DE) 2012-02-22 EP disclosed
EP-0774687-B1 Solid processing composition and method for processing silver halide photographic light-sensitive material KONISHIROKU PHOTO IND (JP) 2004-09-15 EP disclosed
EP-0777150-B1 Developing composition for silver halide photographic light sensitive material KONISHIROKU PHOTO IND (JP) 2003-09-17 EP disclosed
EP-0766134-B1 Solid developer-replenishing composition for processing silver halide photographic light sensitive material KONISHIROKU PHOTO IND (JP) 2000-12-13 EP disclosed
US-6066444-A ATLEAST A PHOTOGRAPHIC COMPONENT LAYER CONTAINS A LANTHANOID TRIFLATE COMPOUND; SUPERIOR IN CONTRAST AND STABILITY KONICA CORPORATION (JP) 2000-05-23 US disclosed
EP-0767404-B1 Method for processing silver halide photographic light-sensitive material KONISHIROKU PHOTO IND (JP) 2000-03-08 EP disclosed
EP-0965881-A1 Silver halide light sensitive photographic material KONICA CORPORATION (JP) 1999-12-22 EP disclosed
US-5972577-A SUPPLYING A PROCESSING SOLUTION CONTAINING A FIXER TO THE ROLLER AND/OR THE SOLUTION COLLECTING VESSEL THROUGH GRAVITY FLOW AND/OR OVERFLOW KONICA CORPORATION (JP) 1999-10-26 US disclosed
US-5851742-A Solid processing composition and method for processing silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1998-12-22 US disclosed
US-5804358-A Developing composition for silver halide photographic light sensitive material KONICA CORPORATION (JP) 1998-09-08 US disclosed
EP-0860738-A1 Processing method of silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1998-08-26 EP disclosed
US-5766832-A CONTAINING CYCLODEXTRIN COMPOUND, ASCORBIC ACID DERIVATIVE DEVELOPER, 3-PYRAZOLIDONE OR PARA-AMINOPHENOL COMPOUND; STABILITY KONICA CORPORATION (JP) 1998-06-16 US disclosed
US-5721094-A DEVELOPING EXPOSED MATERIAL IN AUTOMATIC MACHINE USING DEVELOPER CONTAINING ASCORBIC ACID DERIVATIVE AND NO DIHYDROXYBENZENE COMPOUND KONICA CORPORATION (JP) 1998-02-24 US disclosed
EP-0777150-A1 Developing composition for silver halide photographic light sensitive material KONICA CORPORATION (JP) 1997-06-04 EP disclosed
EP-0774687-A1 Solid processing composition and method for processing silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1997-05-21 EP disclosed
EP-0767404-A2 Method for processing silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1997-04-09 EP disclosed
EP-0766134-A2 Solid developer-replenishing composition for processing silver halide photographic light sensitive material KONICA CORPORATION (JP) 1997-04-02 EP disclosed
US-5112914-A Blend of polyphenylene ether, thermoplastic polyester and amino resin SUMITOMO CHEMICAL CO., LTD. (JP) 1992-05-12 US disclosed
EP-0381391-A2 Resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1990-08-08 EP disclosed