⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6105664 | 0.93 | — | — | |
| SCHEMBL10167250 | 0.91 | — | — | |
| SCHEMBL17417859 | 0.91 | — | — | |
| SCHEMBL17922542 | 0.91 | — | — | |
| SCHEMBL6323503 | 0.91 | — | — | |
| SCHEMBL25424694 | 0.90 | — | — | |
| SCHEMBL21087300 | 0.90 | — | — | |
| SCHEMBL2470367 | 0.84 | — | — | |
| SCHEMBL9077026 | 0.79 | — | — | |
| SCHEMBL17417865 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9879153-B2 | Anti-icing composite | WANG LIANG (US) | 2018-01-30 | — | — | US | disclosed |
| US-9310682-B2 | Positive-type resist composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20160009971-A1 | Anti-Icing Composite | WANG LIANG (US) | 2016-01-14 | — | — | US | disclosed |
| US-20140134542-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-05-15 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| EP-0701986-B1 | Process for production of unsaturated ether and catalyst used for production of unsaturated ether | NIPPON CATALYTIC CHEM IND (JP) | 1997-12-29 | — | — | EP | disclosed |
| US-5650544-A | Process for production of unsaturated ether and catalyst used for production of unsaturated ether | NIPPON SHOKUBAI CO., LTD. (JP) | 1997-07-22 | — | — | US | disclosed |
| EP-0701986-A1 | Process for production of unsaturated ether and catalyst used for production of unsaturated ether | NIPPON SHOKUBAI CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |
| EP-0459369-B1 | Fluorine-containing polymer for paints and paint composition containing the polymer | DAIKIN IND LTD (JP) | 1995-03-15 | — | — | EP | disclosed |
| EP-0335361-B1 | Electrodeposition coating composition | KANSAI PAINT CO LTD (JP) | 1994-06-15 | — | — | EP | disclosed |
| US-5171804-A | Electrodeposition coating | DAIKIN INDUSTRIES, LTD. (JP) | 1992-12-15 | — | — | US | disclosed |
| EP-0459369-A1 | Fluorine-containing polymer for paints and paint composition containing the polymer | DAIKIN INDUSTRIES, LTD. (JP) | 1991-12-04 | — | — | EP | disclosed |
| US-5008327-A | Curable fluorine containing copolymer of fluoroolefin and hydroxy vinyl ether | KANSAI PAINT CO., LTD. (JP) | 1991-04-16 | — | — | US | disclosed |