⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL6322634 | 1.00 | — | — | |
| Fluoride SCHEMBL5133935 | 0.82 | — | — | |
| Fluoride SCHEMBL582478 | 0.82 | — | — | |
| Fluoride SCHEMBL29860 | 0.82 | — | — | |
| Fluoride SCHEMBL2185288 | 0.82 | — | — | |
| Fluoride SCHEMBL7569414 | 0.82 | — | — | |
| Fluoride SCHEMBL11879207 | 0.82 | — | — | |
| SCHEMBL1890360 | 0.82 | — | — | |
| Fluoride SCHEMBL11644367 | 0.82 | — | — | |
| Fluoride SCHEMBL11437217 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6894284-B2 | UV optical fluoride crystal elements for λ < 200nm laser lithography and methods therefor | CORNING INCORPORATED (US) | 2005-05-17 | — | — | US | disclosed |
| US-6838681-B2 | Detection and making of ultralow lead contaminated UV optical fluoride crystals for <200nm lithography | CORNING INCORPORATED (US) | 2005-01-04 | — | — | US | disclosed |
| WO-2004015453-A2 | DETECTION AND MAKING OF ULTRALOW LEAD CONTAMINATED UV OPTICAL FLUORIDE CRYSTALS FOR < 200 NM LITHOGRAPHY | CORNING INCORPORATED (US) | 2004-02-19 | — | — | WO | disclosed |
| US-20040026631-A1 | Detection and making of ultralow lead contaminated UV optical fluoride crystals for < 200nm lithography | CORNING INCORPORATED | 2004-02-12 | — | — | US | disclosed |
| US-20030160177-A1 | UV optical fluoride crystal elements for lambda < 200nm laser lithography and methods therefor | HELLMA MATERIALS GMBH & CO. KG (DE) | 2003-08-28 | — | — | US | disclosed |
| WO-2003052392-A1 | UV OPTICAL FLUORIDE CRYSTAL ELEMENTS FOR μ<200NM LASER LITHOGRAPHY AND METHODS THEREFORE | CORNING INCORPORATED (US) | 2003-06-26 | — | — | WO | disclosed |