SCHEMBL6323730

SCHEMBL6323730

CCCCOC(=O)c1cccc(NC(=O)NS(=O)(=O)c2ccccc2Cl)c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.60
SMN1; SMN2 Q16637 5/20 0.60
TP53 P04637 2/20 0.60
NPC1 O15118 6/20 0.54
RAB9A P51151 5/20 0.54
HPGD P15428 2/20 0.54
CYP1A2 P05177 2/20 0.54
CYP2C9 P11712 2/20 0.54
CYP2C19 P33261 2/20 0.54
ALDH1A1 P00352 2/20 0.50
LMNA P02545 2/20 0.49
CA12 O43570 2/20 0.47
CA1 P00915 2/20 0.47
CA9 Q16790 2/20 0.47
CA2 P00918 1/20 0.47
KMT2A Q03164 5/20 0.46
MEN1 O00255 4/20 0.46
PPARA Q07869 1/20 0.46
GPR35 Q9HC97 1/20 0.46
POLB P06746 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6329425 0.89 SMN1; SMN2 (0.58) MAPTSMN1; SMN2TP53NPC1RAB9A
SCHEMBL6732258 0.89 HPGD (0.55) MAPTSMN1; SMN2NPC1RAB9AHPGD
SCHEMBL6326659 0.85 SMN1; SMN2 (0.53) MAPTSMN1; SMN2TP53NPC1RAB9A
SCHEMBL6331748 0.85 SMN1; SMN2 (0.53) MAPTSMN1; SMN2TP53NPC1RAB9A
SCHEMBL6323993 0.85 SMN1; SMN2 (0.53) MAPTSMN1; SMN2TP53NPC1RAB9A
SCHEMBL6322963 0.85 SMN1; SMN2 (0.55) MAPTSMN1; SMN2TP53NPC1RAB9A
SCHEMBL1931062 0.83 SMN1; SMN2 (0.50) MAPTSMN1; SMN2TP53NPC1RAB9A
SCHEMBL1931137 0.83 SMN1; SMN2 (0.50) MAPTSMN1; SMN2TP53NPC1RAB9A
SCHEMBL1930264 0.82 SMN1; SMN2 (0.49) MAPTSMN1; SMN2TP53NPC1RAB9A
SCHEMBL1929112 0.82 SMN1; SMN2 (0.49) MAPTSMN1; SMN2TP53NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6884862-B2 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2005-04-26 US disclosed
US-6858565-B2 Thermosensitive recording material and novel color developer compounds OJI PAPER CO., LTD. (JP) 2005-02-22 US disclosed
US-20030040434-A1 Thermosensitive recording material and novel color developer compounds OJI PAPER CO., LTD. (JP) 2003-02-27 US disclosed
EP-1264707-A2 Thermosensitive recording material and novel color developer compounds OJI PAPER CO., LTD. (JP) 2002-12-11 EP disclosed
US-20020161173-A1 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2002-10-31 US disclosed
EP-1061112-A1 ORGANIC ELECTROLUMINESCENT ELEMENT IDEMITSU KOSAN COMPANY LIMITED (JP) 2000-12-20 EP disclosed