⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14265430 | 0.87 | — | — | |
| SCHEMBL14265434 | 0.87 | — | — | |
| SCHEMBL14265422 | 0.83 | — | — | |
| SCHEMBL14265438 | 0.83 | — | — | |
| SCHEMBL20500131 | 0.81 | — | — | |
| SCHEMBL14265436 | 0.81 | — | — | |
| SCHEMBL3152023 | 0.80 | — | — | |
| SCHEMBL191119 | 0.80 | — | — | |
| SCHEMBL14265448 | 0.79 | — | — | |
| SCHEMBL14265449 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11670512-B2 | Selective deposition on silicon containing surfaces | VERSUM MATERIALS US, LLC (US) | 2023-06-06 | — | — | US | claimed |
| CN-110612364-B | Selective deposition on silicon-containing surfaces | 弗萨姆材料美国有限责任公司 | 2022-04-05 | — | — | CN | claimed |
| US-20210118684-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC | 2021-04-22 | — | — | US | claimed |
| WO-2018170382-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| US-11670512-B2 | Selective deposition on silicon containing surfaces | VERSUM MATERIALS US, LLC (US) | 2023-06-06 | — | — | US | disclosed |
| CN-110612364-B | Selective deposition on silicon-containing surfaces | 弗萨姆材料美国有限责任公司 | 2022-04-05 | — | — | CN | disclosed |
| US-20210118684-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC | 2021-04-22 | — | — | US | disclosed |
| WO-2018170382-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | disclosed |
| WO-2012091154-A1 | METHOD OF PRODUCING A HYDROLYZABLE SILICON-CONTAINING COMPOUND | WASEDA UNIVERSITY (JP) | 2012-07-05 | — | — | WO | disclosed |
| US-7344235-B2 | Ink composition for ink jet recording, ink cartridge, nozzle plate for ink jet recording, ink jet head, and recording apparatus | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2008-03-18 | — | — | US | disclosed |
| US-20050118742-A1 | Method for reducing the adhesive properties of MEMS and anti-adhesion-coated device | ROBERT BOSCH GMBH (DE) | 2005-06-02 | — | — | US | disclosed |
| EP-0679654-B1 | Process for preparation of organooxysilanes | DOW CORNING (US) | 1999-07-07 | — | — | EP | disclosed |
| EP-0679654-A1 | Process for preparation of organooxysilanes | DOW CORNING CORPORATION (US) | 1995-11-02 | — | — | EP | disclosed |
| US-5374761-A | Process for preparation of organooxysilanes | CORNING CORPORATION (US) | 1994-12-20 | — | — | US | disclosed |