SCHEMBL63275

SCHEMBL63275

C[Sn](C)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL8201223 0.87
SCHEMBL151359 0.83
SCHEMBL128985 0.83
SCHEMBL11027103 0.77
Isopropyl Alcohol SCHEMBL28600224 0.74
SCHEMBL1538978 0.72
SCHEMBL7173656 0.65
Methylamine SCHEMBL17502493 0.62
SCHEMBL133545 0.61
SCHEMBL97522 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 6995 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122037216-A Preparation method and application of alkane ligand modified hepta-core high-nuclear cluster compound 哈尔滨理工大学 2026-05-15 CN claimed
US-12622232-B2 Advanced self aligned multiple patterning using tin oxide LAM RESEARCH CORPORATION (US) 2026-05-05 US claimed
CN-119775179-B Polythiol compound, preparation method thereof and application thereof in optical materials 益丰新材料股份有限公司 2026-02-27 CN claimed
US-20260015521-A1 THERMOSETTING COATING COMPOSITION WITH IMPROVED SCRATCH RESISTANCE EASTMAN CHEMICAL COMPANY (US) 2026-01-15 US claimed
US-12455504-B2 Metalorganic films for extreme ultraviolet patterning TOKYO ELECTRON LIMITED (JP) 2025-10-28 US claimed
US-12449728-B2 High quantum efficiency dry resist for low exposure dose of EUV radiation ENTEGRIS, INC. (US) 2025-10-21 US claimed
US-12421417-B2 Thermosetting coating composition with improved scratch resistance EASTMAN CHEMICAL COMPANY (US) 2025-09-23 US claimed
US-20250282677-A1 METHOD OF FORMING A TIN OXIDE COATING PILKINGTON GROUP LIMITED (GB) 2025-09-11 US claimed
EP-4584221-A1 PROCESS FOR DEPOSITING A LAYER Pilkington Group Limited (GB) 2025-07-16 EP claimed
US-20250224679-A1 RESIST PATTERN FORMATION METHOD JSR CORPORATION (JP) 2025-07-10 US claimed
EP-0018327-A2 Process for the preparation of methylalkyltindichloride and use of the compounds so produced CIBA-GEIGY AG (CH) 1980-10-29 EP claimed
US-4146657-A METHOD OF DEPOSITING ELECTRICALLY CONDUCTIVE, INFRA-RED REFLECTIVE, TRANSPARENT COATINGS OF STANNIC OXIDE GORDON ROY G 1979-03-27 US claimed
US-4129584-A Process for preparing dimethyltin dichloride PENNWALT CORPORATION (US) 1978-12-12 US claimed
US-4128565-A Process for preparing methyltin chlorides SANKYO ORGANIC CHEMICALS COMPANY LIMITED (JP) 1978-12-05 US claimed
US-4052426-A FROM TIN OR ALLOY AND METHYL CHLORIDE, ALKYLPHOSPHONIUM CHLORIDE-TIN CHLORIDE COMPLEX CATALYST CIBA-GEIGY CORPORATION (US) 1977-10-04 US claimed
US-4052427-A PROCESS FOR THE PREPARATION OF DIALKYLTIN DIHALIDES WITCO CHEMICAL CORPORATION (US) 1977-10-04 US claimed
US-4041060-A Process for synthesizing organo-tin compounds HAAN ANDRE PAUL DE 1977-08-09 US claimed
US-3971817-A DISPROPORTIONATION OF DIMETHYL-TIN DICHLORIDE AND TIN TETRACHLORIDE CIBA-GEIGY CORPORATION (US) 1976-07-27 US claimed
US-3954576-A Electrolytic process for preparing tetravalent alkyltin halide compositions E. I. DU PONT DE NEMOURS AND COMPANY (US) 1976-05-04 US claimed
US-3954820-A COMPLEX CATALYST OF A HYDROCARBYL METAL HALIDE AND A DIHYDROCARBYL SULFOXIDE FERRO CORPORATION (US) 1976-05-04 US claimed