Sugi Predict

Sugi Predict / Compounds / SCHEMBL6340218

SCHEMBL6340218

SCHEMBL6340218

Cc1cc(Cc2cc(C)c(O)c(C)c2)ccc1O

nearest known ligand 0.83

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 6/20 0.83
▸ ESR2 Q92731 4/20 0.83
▸ CA1 P00915 1/20 0.52
▸ CA2 P00918 1/20 0.52
▸ CA4 P22748 1/20 0.52
▸ CA6 P23280 1/20 0.52
▸ SHBG P04278 1/20 0.52
▸ PTGS1 P23219 2/20 0.48
▸ PTGS2 P35354 2/20 0.48
▸ HMGB1 P09429 1/20 0.48
▸ CXCL12 P48061 1/20 0.48
▸ TP53 P04637 1/20 0.46
▸ TDP1 Q9NUW8 1/20 0.46
▸ THRA P10827 1/20 0.45
▸ THRB P10828 1/20 0.45
▸ AR P10275 3/20 0.44
▸ IDH1 O75874 1/20 0.44
▸ PDE10A Q9Y233 1/20 0.43
▸ CALM1 P0DP23 1/20 0.43
▸ KLKB1 P03952 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36509 0.91 ESR1 (1.00) ESR1ESR2CA1CA2CA4
SCHEMBL29357262 0.91 ESR1 (1.00) ESR1ESR2CA1CA2CA4
SCHEMBL29485633 0.91 ESR1 (1.00) ESR1ESR2CA1CA2CA4
SCHEMBL8351876 0.91 ESR1 (0.69) ESR1ESR2CA1CA2CA4
SCHEMBL28112452 0.90 CA1 (0.68) ESR1ESR2CA1CA2CA4
SCHEMBL29636483 0.89 ESR1 (0.71) ESR1ESR2CA1CA2CA4
SCHEMBL3187895 0.89 ESR1 (0.71) ESR1ESR2CA1CA2CA4
SCHEMBL4063169 0.89 ESR1 (0.71) ESR1ESR2CA1CA2CA4
SCHEMBL4055517 0.89 ESR1 (0.71) ESR1ESR2CA1CA2CA4
SCHEMBL14462649 0.87 ESR1 (0.63) ESR1ESR2CA1CA2CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106933034-B Positive photoresist composition 东京应化工业株式会社 2023-01-06 — — CN disclosed
CN-105301899-B Photosensitive resin composition for forming insulating film in organic E L display element 东京应化工业株式会社 2020-08-07 — — CN disclosed
US-10185237-B2 Electrophotographic photoreceptor, electrophotographic photoreceptor cartridge, image forming apparatus, and polyarylate resin MITSUBISHI CHEMICAL CORPORATION (JP) 2019-01-22 — — US disclosed
US-20160124327-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC PHOTORECEPTOR CARTRIDGE, IMAGE FORMING APPARATUS, AND POLYARYLATE RESIN MITSUBISHI CHEMICAL CORPORATION (JP) 2016-05-05 — — US disclosed
US-20160124327-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC PHOTORECEPTOR CARTRIDGE, IMAGE FORMING APPARATUS, AND POLYARYLATE RESIN MITSUBISHI CHEMICAL CORPORATION (JP) 2016-05-05 — — US disclosed
CN-105301899-A Photosensitive resin composite for forming insulating film in organic EL display element TOKYO OHKA KOGYO CO LTD 2016-02-03 — — CN disclosed
CN-102667623-B Methods of directed self-assembly and layered structures formed therefrom IBM 2014-09-17 — — CN disclosed
US-6964838-B2 Positive photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 2005-11-15 — — US disclosed
US-6620978-B2 Esterification of a quinonediazide compound; photosensitizer TOKYO OHKA KOGYO CO., LTD. (JP) 2003-09-16 — — US disclosed
US-20030054283-A1 Positive photoresist composition and process for synthesizing polyphenol compound TOKYO OHKA KOGYO CO., LTD. 2003-03-20 — — US disclosed
US-20020132178-A1 Positive photoresist composition TOKYO OHKA KOGYO CO., LTD. 2002-09-19 — — US disclosed
US-20020119390-A1 Positive photoresist composition and process for forming resist pattern using same TOKYO OHKA KOGYO CO., LTD. 2002-08-29 — — US disclosed