⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trimethylammonium SCHEMBL1264353 | 1.00 | — | — | |
| Trimethylammonium SCHEMBL2113580 | 1.00 | — | — | |
| Trimethylammonium SCHEMBL27539486 | 1.00 | — | — | |
| Trimethylammonium SCHEMBL2113497 | 1.00 | — | — | |
| Trimethylammonium SCHEMBL2114787 | 1.00 | — | — | |
| Trimethylammonium SCHEMBL2112418 | 1.00 | — | — | |
| Trimethylammonium SCHEMBL29180917 | 0.91 | — | — | |
| Trimethylammonium SCHEMBL27471374 | 0.91 | — | — | |
| Trimethylammonium SCHEMBL28807619 | 0.91 | — | — | |
| Trimethylammonium SCHEMBL27505093 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 362 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117246982-B | Lithium bis (fluorosulfonyl) imide and method for purifying lithium bis (fluorosulfonyl) imide | Shidai Sikang New Material Co.,Ltd. (CN) | 2026-05-26 | — | — | CN | claimed |
| US-12404231-B2 | Method for preparing trifluoromethyl aromatic compound | JINGDEZHEN FUSHINE LIFE TECHNOLOGY CO., LTD. (CN) | 2025-09-02 | — | — | US | claimed |
| US-20250257028-A1 | Method for Preparing Trifluoromethyl Aromatic Compound | JINGDEZHEN FUSHINE LIFE TECHNOLOGY CO., LTD. (CN) | 2025-08-14 | — | — | US | claimed |
| CN-120118250-A | Surfactant, preparation method and application thereof | 浙江蓝天环保高科技股份有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-120118223-A | Method for adjusting particle size of fluorine-containing polymer emulsion | 浙江蓝天环保高科技股份有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-117964490-B | Preparation method of trifluoromethyl aromatic compound | 景德镇富祥生命科技有限公司 | 2024-12-20 | — | — | CN | claimed |
| CN-118908934-A | Compounds, methods of preparation and uses thereof | 宁德时代新能源科技股份有限公司 | 2024-11-08 | — | — | CN | claimed |
| CN-118272091-A | Etching composition and application thereof | 安集微电子科技（上海）股份有限公司 | 2024-07-02 | — | — | CN | claimed |
| CN-118256250-A | Etching composition and application thereof | 宁波安集微电子科技有限公司 | 2024-06-28 | — | — | CN | claimed |
| CN-117964490-A | Preparation method of trifluoromethyl aromatic compound | 景德镇富祥生命科技有限公司 | 2024-05-03 | — | — | CN | claimed |
| US-20030205785-A1 | Low k film application for interlevel dielectric and method of cleaning etched features | MICRON TECHNOLOGY, INC. | 2003-11-06 | — | — | US | claimed |
| US-20030207514-A1 | Low k film application for interlevel dielectric and method of cleaning etched features | MICRON TECHNOLOGY, INC. | 2003-11-06 | — | — | US | claimed |
| US-6605863-B2 | Trimethylammonium fluoride solution to selectively etch a dielectric antireflective coating of silicon oxynitride or silicon oxide layer on tetraethylorthosilicate substrate | MICRON TECHNOLOGY, INC. | 2003-08-12 | — | — | US | claimed |
| US-20030102532-A1 | LOW K FILM APPLICATION FOR INTERLEVEL DIELECTRIC AND METHOD OF CLEANING ETCHED FEATURES | MICRON TECHNOLOGY, INC. (US) | 2003-06-05 | — | — | US | claimed |
| US-6573175-B1 | Dry low k film application for interlevel dielectric and method of cleaning etched features | MICRON TECHNOLOGY, INC. | 2003-06-03 | — | — | US | claimed |
| US-6001549-A | IMAGING ELEMENT CONTAINING ANTISTATIC AGENT | EASTMAN KODAK COMPANY (US) | 1999-12-14 | — | — | US | claimed |
| EP-0633264-B1 | Tertiary amino-aluminoxane halides | ALBEMARLE CORP (US) | 1999-03-03 | — | — | EP | claimed |
| US-5466647-A | Olefin polymerization catalyst | ALBEMARLE CORPORATION (US) | 1995-11-14 | — | — | US | claimed |
| US-5412131-A | Olefin polymerization catalyst | ALBEMARLE CORPORATION (US) | 1995-05-02 | — | — | US | claimed |
| EP-0633264-A1 | Tertiary amino-aluminoxane halides | ALBEMARLE CORPORATION (US) | 1995-01-11 | — | — | EP | claimed |